CONFERENCE PROCEEDINGS
Advanced Search
Tomoko Kamimoto
at Seiko Instruments Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 20 August 2004 Paper
Improvement of unified mask data formats for EB writers
Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi Watanabe, Hidemichi Kawase, Tomoko Kamimoto, Kokoro Kato
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557738
KEYWORDS: Data conversion, Photomasks, Vestigial sideband modulation, Manufacturing, Data compression, Printing, Prototyping, Resolution enhancement technologies, Semiconductors, Nanotechnology
Proceedings Article | 17 December 2003 Paper
Investigation of an enhanced mask data preparation system using unified mask data formats
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518436
KEYWORDS: Data conversion, Manufacturing, Vestigial sideband modulation, Photomasks, Data processing, Resolution enhancement technologies, Parallel processing, Prototyping, Semiconductors, Neodymium
Proceedings Article | 28 August 2003 Paper
GDS2NEO: high-compression data processing system for a new EB handling format
Hidemuchi Kawase, Tomoko Kamimoto, Hiroji Ogasawara, Koki Kuriyama, Junji Hirumi, Nobuyuki Yoshioka
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504272
KEYWORDS: Data conversion, Photomasks, Data processing, Optical proximity correction, Manufacturing, Data compression, Array processing, Software development, Semiconductors, Inspection
Proceedings Article | 28 August 2003 Paper
Unified mask data formats for EB writers
Koki Kuriyama, Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi Watanabe, Masa Inoue, Hidemuchi Kawase, Tomoko Kamimoto
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504218
KEYWORDS: Photomasks, Manufacturing, Vestigial sideband modulation, Data modeling, Data conversion, Data processing, Semiconductors, Instrument modeling, Resolution enhancement technologies, Optical proximity correction
Proceedings Article | 27 December 2002 Paper
Development of new stream format with GDSII upper compatibility and high compression rate
Koki Kuriyama, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi Watanabe, Masaru Inoue, Hidemuchi Kawase, Tomoko Kamimoto
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467910
KEYWORDS: Data conversion, Manufacturing, Photomasks, Optical proximity correction, Software development, Electronic design automation, Data processing, Data compression, Standards development, Data modeling
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top