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Dr. Tzong-Shane Wu
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 4 March 2010 Paper
A novel decomposition of source kernel for OPC modeling
C. T. Hsuan, T. S. Wu, Fred Lo, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu
Proceedings Volume 7640, 764037 (2010) https://doi.org/10.1117/12.845763
KEYWORDS: Optical proximity correction, Calibration, Data modeling, Optical simulations, Lithography, Photomasks, Lithographic illumination, Wafer-level optics, Projection systems, Semiconducting wafers
Proceedings Article | 7 March 2008 Paper
Novel lithography rule check for full-chip side lobe detection
T. S. Wu, Elvis Yang, T. H. Yang, K. C. Chen, C. Y. Lu
Proceedings Volume 6924, 692431 (2008) https://doi.org/10.1117/12.770882
KEYWORDS: Photomasks, Lithography, Printing, Scattering, Phase shifts, Resolution enhancement technologies, Model-based design, Optical proximity correction, Optical lithography, Lutetium
Proceedings Article | 20 March 2006 Paper
Dual antireflection layers for ARC/hard-mask applications
Victor Huang, T.S. Wu, Mars Yang, Francis Lin, Elvis Yang, T.H. Yang, K.C. Chen, Joseph Ku, C.Y. Lu
Proceedings Volume 6154, 61543Q (2006) https://doi.org/10.1117/12.656093
KEYWORDS: Reflectivity, Critical dimension metrology, Lithography, Etching, Interfaces, Optical lithography, Antireflective coatings, Dielectrics, Oxides, Photomasks
Proceedings Article | 26 June 2003 Paper
Low-proximity contact hole formation by using double-exposure technology (DET)
Charles Chang, Elvis Yang, Tzong-Shane Wu, Ta-Hung Yang, Calvin Hsueh
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485365
KEYWORDS: Argon, Etching, Photoresist processing, Photomasks, Resolution enhancement technologies, Ion implantation, Skin, Lithography, Printing, Optical lithography
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