Mr. Walter Wang Profile

Walter Wang

at Nanya Technology Corp

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Author

Publications (3)

Proceedings Article | 16 April 2011 Paper

A novel double patterning approach for 30nm dense holes

Wen-Bin Wu, Dennis Shu-Hao Hsu, Chiang-Lin Shih, Chun-Yen Huang, Wei-Hsien Hsieh, Steven Shih, Walter Wang

Proceedings Volume 7972, 79720D (2011) https://doi.org/10.1117/12.879374

KEYWORDS: Image processing, Double patterning technology, Optical lithography, Etching, Lithography, Manufacturing, Coating, Extreme ultraviolet, Materials processing, Overlay metrology

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Proceedings Article | 26 March 2010 Paper

Carbon-rich spin on sidewall material for self-aligned double-patterning technology

Bang-Ching Ho, Walter Wang, Chun-Yen Huang, Daisuke Maruyama, Hiroaki Yaguchi, Yasushi Sakaida, Wen-Bin Wu, Chiang-Lin Shih, Dennis Shu-Hao Hsu, Rikimaru Sakamoto

Proceedings Volume 7639, 763908 (2010) https://doi.org/10.1117/12.846267

KEYWORDS: Ultraviolet radiation, Amplifiers, Double patterning technology, Thin film coatings, Etching, Chemical reactions, Photoresist processing, Diffusion, Polymers, Industrial chemicals

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Proceedings Article | 4 December 2008 Paper

Developing loading effect on lithography I-line process

Chiang-Lin Shih, Chun-Yen Huang, Walter Wang, Ting-Jhen Guo, Thomas Huang, Nick Tseng, Wen-Bin Wu

Proceedings Volume 7140, 71403J (2008) https://doi.org/10.1117/12.804659

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Lithography, Photomasks, Semiconductor manufacturing, Semiconductors, Manufacturing, Transmittance, Current controlled current source

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