Ms. Yoko Takebe Profile

Yoko Takebe

Senior Researcher at Asahi Glass Co Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 March 2008 Paper

Highly hydrophobic materials for ArF immersion lithography

Osamu Yokokoji, Takashi Sasaki, Koichi Murata, Naoko Shirota, Yoko Takebe

Proceedings Volume 6923, 69231U (2008) https://doi.org/10.1117/12.772525

KEYWORDS: Polymers, Immersion lithography, Sputter deposition, Polymer thin films, Interfaces, Photoresist processing, Polymerization, Lithography, Scanning electron microscopy, Ions

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Proceedings Article | 26 March 2008 Paper

Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography

Hiroshi Akiyama, Tetsuro Hanawa, Takeo Ishibash, Tomoharu Fujiwara, Yoko Takebe, Takuya Hagiwara, Mamoru Terai, Teruhiko Kumada, Osamu Yokokoji

Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794

KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

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Proceedings Article | 2 April 2007 Paper

Development of non-topcoat resist polymers for 193-nm immersion lithography

Osamu Yokokoji, Naoko Shirota, Takashi Sasaki, Shu-Zhong Wang, Yoko Takebe

Proceedings Volume 6519, 651905 (2007) https://doi.org/10.1117/12.712057

KEYWORDS: Polymers, Immersion lithography, Polymer thin films, Polymerization, Photoresist processing, Coating, Fluorine, Imaging systems, Lithography, Semiconducting wafers

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Proceedings Article | 2 April 2007 Paper

Development of top coat materials for ArF immersion lithography

Takashi Sasaki, Naoko Shirota, Osamu Yokokoji, Yoko Takebe

Proceedings Volume 6519, 65191Y (2007) https://doi.org/10.1117/12.711867

KEYWORDS: Polymers, Fluorine, Immersion lithography, Thin film coatings, Lithography, Polymerization, Scanning electron microscopy, Polymer thin films, Optical lithography, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

Development of fluoropolymer for 193nm immersion lithography

Naoko Shirota, Minoru Toriumi, Takashi Sasaki, Hiroshi Masuhara, Yoko Takebe, Osamu Yokokoji

Proceedings Volume 6153, 615324 (2006) https://doi.org/10.1117/12.656234

KEYWORDS: Polymers, Diffusion, Fluorine, Immersion lithography, Crystals, Quartz, Silicon, Water, Data analysis, Oscillators

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Proceedings Article | 29 March 2006 Paper

Development of new resist materials for 193-nm dry and immersion lithography

Osamu Yokokoji, Naoko Shirota, Takashi Sasaki, Yoko Takebe

Proceedings Volume 6153, 61530E (2006) https://doi.org/10.1117/12.656141

KEYWORDS: Polymers, Diffusion, Fluorine, Lithography, Resistance, Immersion lithography, Dry etching, Transparency, Etching, Absorption

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Proceedings Article | 4 May 2005 Paper

A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists

Kiyoshi Fujii, Yoko Takebe, Takashi Sasaki, Akihiko Otoguro, Osamu Yokokoji

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599162

KEYWORDS: Polymers, Resistance, Transparency, Lithography, Fluorine, Polymerization, Etching, Virtual colonoscopy, Absorption, Photoresist materials

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Proceedings Article | 14 May 2004 Paper

157-nm single-layer resist based on novel monocyclic fluorinated polymer

Akihiko Otoguro, Yasuhide Kawaguchi, Toshiro Itani, Shigeo Irie, Kiyoshi Fujii, Osamu Yokokoji, Yoko Takebe

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535013

KEYWORDS: Polymers, Absorption, Standards development, Etching, Resistance, Lithography, Fluorine, Dry etching, Photomasks, Transparency

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Proceedings Article | 14 May 2004 Paper

A new monocyclic fluropolymer structure for 157-nm photoresists

Kiyoshi Fujii, Yoko Takebe, Akihiko Otoguro, Toshiro Itani, Masataka Eda, Shigeo Irie, Osamu Yokokoji, Shinji Okada

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533932

KEYWORDS: Polymers, Transparency, Etching, Resistance, Polymerization, Fluorine, Photoresist materials, Lithography, Chemical species, Microelectromechanical systems

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Proceedings Article | 12 June 2003 Paper

Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Jun Irisawa, Yasuhide Kawaguchi, Seiichi Ishikawa, Shun-ichi Kodama, Shinji Okada, Yoko Takebe, Shigeo Irie, Osamu Yokokoji, Takuya Hagiwara, Isamu Kaneko, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483735

KEYWORDS: Polymers, Resistance, Etching, Chemical species, Fluorine, Transparency, Absorption, Lithography, Semiconducting wafers, Gases

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