Dr. Yung-Cheng Chang Profile

Dr. Yung-Cheng Chang

Technology Dept Director at AZ Electronic Materials Taiwan Co Ltd

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Publications (9)

Proceedings Article | 31 March 2010 Paper

Accelerating the dual damascene process time by new filling material

Kung-Hsun Tsao, Yu-Huan Liu, Tsz-Yuan Chen, Chih-Jung Chen, C. Huang, Yung-Cheng Chang, Go Noya, Nick Hsiao, Simon Chiu, Vencent Chang, Tomohide Katayama, Hisashi Motobayashi

Proceedings Volume 7639, 76392A (2010) https://doi.org/10.1117/12.855997

KEYWORDS: Etching, Coating, Lithography, Optical lithography, Yield improvement, Semiconducting wafers, Absorption, Chemistry, Reflectivity, Natural surfaces

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Proceedings Article | 14 May 2004 Paper

Application of photosensitive BARC and KrF resist on implant layers

D.C. Owe-Yang, Bang-ching Ho, Shinji Miyazaki, Tomohide Katayama, Kenji Susukida, Wenbing Kang, Yung-Cheng Chang

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534735

KEYWORDS: Critical dimension metrology, Photoresist processing, Lithography, Dry etching, Semiconducting wafers, Antireflective coatings, Bottom antireflective coatings, Reflection, Plasma etching, Chemically amplified resists

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The IC industry is moving toward 90nm node and below. The CD size of implant layers has shrunk to 220nm. To achieve better CD uniformity, dyed KrF resist and top anti-reflective coating (TARC) are commonly used in advanced photo process of implant layers. It’s well known that bottom anti-reflective coating (BARC) has better reflection control over TARC. However, dry etching process is required if typical organic BARC is applied to photo process of implant layers. It is undesirable for two reasons. The first reason is the substrate damage caused by plasma etching could affect the device performance. The second reason is higher cost due to additional processing steps. In order to overcome those two shortcomings, developable BARC (DBARC) is introduced. It is a new type of BARC, which is soluble to developer, TMAH solution, in the resist development step. There are some reports on the developer-soluble KrF BARC. Most of them are polyamic acid and their solubility to alkline could be adjusted by changing bake condition. However, its development is isotropic, which make it difficult to get a vertical profile. Therefore, we have developed a photosensitive developer-soluble BARC (DBARC) which is anisotropic after exposure and thus results in a nice vertical profile. The photosensitive DBARC utilizes the same concept as chemically amplified resist. It has acid-cleavable groups in the resin and PAGs in the formulation. The photosensitive DBARC turns soluble to TMAH developer after exposure and resist PEB. The solubility difference caused by exposure makes developing process anisotropic and thus improves profile control. In this article, we will report the evaluation results of various combinations of KrF resists and DBARC for implant layers. Since both the resist and DBARC are photosensitive, matching of the photo speeds of them is essential. The amount and type of PAG in both the resist and the DBARC play a very import role. Finally, the optimized combination showed acceptable lithography process window and good CD uniformity over topography.

Proceedings Article | 29 August 2002 Paper

Optically injected rational-harmonic mode locking of erbium-doped fiber laser

Gong-Ru Lin, Yung-Cheng Chang

Proceedings Volume 4905, (2002) https://doi.org/10.1117/12.481022

KEYWORDS: Mode locking, Modulation, Fiber lasers, Laser optics, Picosecond phenomena, Semiconductor lasers, Single sideband modulation, Optical amplifiers, Fabry–Perot interferometers, Electro-optical engineering

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Proceedings Article | 27 December 2001 Paper

Photonic phase-tuning circuit for controlling the delay time of passively mode-locked Ti:sapphire laser

Gong-Ru Lin, Yung-Cheng Chang, Tze-An Liu, Ci-Ling Pan

Proceedings Volume 4490, (2001) https://doi.org/10.1117/12.455432

KEYWORDS: Mode locking, Sapphire lasers, Pulsed laser operation, Clocks, Reflectors, Laser stabilization, Feedback control, Mirrors, Microwave radiation, Photonic integrated circuits

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Proceedings Article | 19 October 2001 Paper

Delay-line-free electro-optic characterization of free-running microwave frequency prescalers

Gong-Ru Lin, Shr-Hsiung Hung, Yung-Cheng Chang

Proceedings Volume 4580, (2001) https://doi.org/10.1117/12.445003

KEYWORDS: Microwave radiation, Electro optics, Clocks, Optoelectronics, Oscilloscopes, Oscillators, Distortion, Signal generators, Picosecond phenomena, Phase shifts

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Proceedings Article | 17 October 2001 Paper

Delay-time tunable mode-locked erbium-doped fiber ring laser

Gong-Ru Lin, Yao-Ling Chen, Yung-Cheng Chang, YinChieh Lai

Proceedings Volume 4581, (2001) https://doi.org/10.1117/12.445035

KEYWORDS: Mode locking, Fiber lasers, Microwave radiation, Tunable lasers, Phase shifts, Phased array optics, Pulsed laser operation, Laser applications, Picosecond phenomena, Optoelectronics

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Proceedings Article | 17 May 2001 Paper

Novel delay-time tunable pulsed laser source

Gong-Ru Lin, Yung-Cheng Chang

Proceedings Volume 4285, (2001) https://doi.org/10.1117/12.426896

KEYWORDS: Oscillators, Phase shifts, Microwave radiation, Clocks, Optoelectronics, Phased array optics, Picosecond phenomena, Phase shift keying, Modulation, Semiconductor lasers

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Proceedings Article | 8 May 2001 Paper

Delay-line-free high-speed electro-optic sampler

Gong-Ru Lin, Yung-Cheng Chang

Proceedings Volume 4416, (2001) https://doi.org/10.1117/12.427070

KEYWORDS: Electro optics, Phase shifts, Microwave radiation, Clocks, Optoelectronics, Oscilloscopes, Picosecond phenomena, Laser beam diagnostics, Switches, Distortion

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Proceedings Article | 11 July 2000 Paper

Optoelectronic frequency discriminated phase tuning technology and its applications

Gong-Ru Lin, Yung-Cheng Chang

Proceedings Volume 4078, (2000) https://doi.org/10.1117/12.392112

KEYWORDS: Microwave radiation, Phase shifts, Optoelectronics, Clocks, Picosecond phenomena, Electro optics, Pulsed laser operation, Semiconductor lasers, Antennas, Oscillators

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Showing 5 of 9 publications

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