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Dr. Yuxiang Yin
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 20 March 2020 Presentation + Paper
Understanding advanced DRAM edge placement error budget and opportunities for control
Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon
Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness
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