Dr. Jeongjin Lee Profile

Dr. Jeongjin Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 10 April 2024 Poster + Paper

Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness

Jungmin Lee, Inbeom Lim, Byeong Seon Park, Changyeon Lee, Mincheol Kwak, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Jay Mummery, Bruno Gregorio Almeida, Han-Gyeol Park, Mi-Yeon Baek, Kemal Dahha, Ki-Youn Lee, Se-Hui Lee, Arno van Leest, Thao Nguyen, Marc Noot, Stefan Smith-Meerman, Koen van Witteveen, Jong-Hyuk Yim, Olger Zwier

Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950

KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

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Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

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Proceedings Article | 27 April 2023 Presentation + Paper

Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren

Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

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Proceedings Article | 26 May 2022 Presentation + Paper

Improved multi-lot overlay performance via phase-based ADI overlay measurements

Doogyu Lee, Jungmin Lee, Eunji Lee, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Kapel, Seung-Bin Yang, Mi-Yeon Baek, Jeroen Wefers Bettink, Se-Ra Jeon, Thomas Kim, Aileen Soco, Olger Zwier, Koen van Witteveen

Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719

KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

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Proceedings Article | 20 March 2020 Presentation + Paper

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Jinsun Kim, Jeongijn Lee, Chan Hwang, Seung Yoon Lee, Wooyoung Jung, Joonsoo Park, Kaustuve Bhattacharyya, Arie den Boef, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Daniel Park, Kaustubh Padhye, Se-Ra Jeon, Seung-Bin Yang, Won-Jae Jang, Oh-Sung Kwon

Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

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Proceedings Article | 20 March 2020 Paper

Enabling accurate and robust optical metrology of in device overlay

Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen

Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing

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Proceedings Article | 20 March 2020 Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 20 March 2020 Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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Proceedings Article | 15 March 2016 Paper

Overcoming low-alignment signal contrast induced alignment failure by alignment signal enhancement

Byeong Soo Lee, Young Ha Kim, Hyunwoo Hwang, Jeongjin Lee, Jeong Heung Kong, Young Seog Kang, Bart Paarhuis, Haico Kok, Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Christopher Mason, Igor Aarts, Wim de Boeij

Proceedings Volume 9780, 97800B (2016) https://doi.org/10.1117/12.2220587

KEYWORDS: Optical alignment, Signal processing, Overlay metrology, Optical lithography, Optics manufacturing, Opacity, Materials processing, Sensors, Wafer testing, Near infrared, Image processing

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Proceedings Article | 8 March 2016 Paper

Metrology target design simulations for accurate and robust scatterometry overlay measurements

Guy Ben-Dov, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Mike Adel, Eitan Herzel, Soonho Oh, DongSub Choi, Sang Hyun Han, Mohamed El Kodadi, Chan Hwang, Jeongjin Lee, Seung Yoon Lee, Kuntack Lee

Proceedings Volume 9778, 97783B (2016) https://doi.org/10.1117/12.2219108

KEYWORDS: Overlay metrology, Metrology, Critical dimension metrology, Scatterometry, Optical testing, Image processing, Scatter measurement, Optical metrology, Diffraction gratings, Diffraction, Semiconducting wafers, Wafer testing, Device simulation

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Proceedings Article | 2 April 2014 Paper

The effect of individually-induced processes on image-based overlay and diffraction-based overlay

SeungHwa Oh, Jeongjin Lee, Seungyoon Lee, Chan Hwang, Gilheyun Choi, Ho-Kyu Kang, EunSeung Jung

Proceedings Volume 9050, 905039 (2014) https://doi.org/10.1117/12.2046583

KEYWORDS: Overlay metrology, Chemical mechanical planarization, Semiconducting wafers, Metals, Image processing, Diffraction, Statistical analysis, Statistical modeling, Error analysis, Electronics

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Proceedings Article | 3 April 2012 Paper

Feasibility study of matched machine overlay enhancement toward next-generation device development

Jeongjin Lee, Seungyoon Lee, Chan Hwang

Proceedings Volume 8324, 832419 (2012) https://doi.org/10.1117/12.916968

KEYWORDS: Scanners, Semiconducting wafers, Distortion, Extreme ultraviolet lithography, Overlay metrology, Extreme ultraviolet, Data modeling, Data corrections, Lithography, Photomasks

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Proceedings Article | 20 April 2011 Paper

Investigation on accuracy of process overlay measurement

Chan Hwang, Jeongjin Lee, Seungyoon Lee, Jeongho Yeo, Yeonghee Kim, Hongmeng Lim, Dongsub Choi

Proceedings Volume 7971, 79711F (2011) https://doi.org/10.1117/12.880299

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Image processing, Scanners, Photoresist processing, Inspection, Nondestructive evaluation, Photomasks, Signal processing

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Showing 5 of 13 publications

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