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Charles Murray
at EUV Technology
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Publications (1)
Proceedings Article | 13 June 2022 Presentation
Development of a standalone zoneplate based EUV mask defect review tool
Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes, Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt, Arnaud Allézy, Weilun Chao, Farhad Salmassi, Eric Gullikson, Patrick Naulleau
Proceedings Volume PC12051, PC120510E (2022) https://doi.org/10.1117/12.2617277
KEYWORDS: Extreme ultraviolet, Photomasks, Reticles, Microscopes, Imaging systems, Zone plates, Semiconductors, Semiconducting wafers, Patents, Metrology
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