Impact of aberrations in EUV lithography: metal to via edge placement control

Lianghong Yin; Ananthan Raghunathan; Germain Fenger; Shumay Shang; Neal Lafferty; John Sturtevant

doi:10.1117/12.2299872

19 March 2018 Impact of aberrations in EUV lithography: metal to via edge placement control

Lianghong Yin, Ananthan Raghunathan, Germain Fenger, Shumay Shang, Neal Lafferty, John Sturtevant

Proceedings Volume 10583, Extreme Ultraviolet (EUV) Lithography IX; 105830Q (2018) https://doi.org/10.1117/12.2299872
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

In previous work, we have described how EUV scanner aberrations can be adequately simulated and corrected in OPC across the slit to deliver excellent edge placement control. The problem is that the level of aberration variability from tool to tool is currently quite significant and leads to uncorrectable edge placement errors if OPC is done using one tool while exposure happens on a different tool. In this study, we examine the impact of such edge placement errors for single patterning EUV exposure of metal and via layers with variable aberrations in projection lens systems. Two-layer combined CD and overlay edge placement hotspots can be compounded by aberrations which impact CDs and image shifts, and do so differently depending upon design pattern and pupil fill. Aberration values from current 3300 / 3350 EUV scanners are used and compared to hypothetical ideal tool with no aberrations and demonstrate very significant uncorrectable edge placement errors with current aberrations levels. The net result is a significant reduction in the metal-via combined CD-overlay process window.

Conference Presentation

Citation Download Citation

Lianghong Yin, Ananthan Raghunathan, Germain Fenger, Shumay Shang, Neal Lafferty, and John Sturtevant "Impact of aberrations in EUV lithography: metal to via edge placement control", Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105830Q (19 March 2018); https://doi.org/10.1117/12.2299872

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available