Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry

Seungwoo Lee; Yeeun Park; Seungryeol Lee; Hoonchul Chang; Jaehwang Jung; Inho Shin; Seoyeon Jeong; Sooyeong Lee; Jinwoo Ahn; Taejoong Kim; Taeyong Jo; Myungjun Lee

doi:10.1117/12.2677195

15 August 2023 Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry

Seungwoo Lee, Yeeun Park, Seungryeol Lee, Hoonchul Chang, Jaehwang Jung, Inho Shin, Seoyeon Jeong, Sooyeong Lee, Jinwoo Ahn, Taejoong Kim, Taeyong Jo, Myungjun Lee

Author Affiliations +

Proceedings Volume 12618, Optical Measurement Systems for Industrial Inspection XIII; 126180B (2023) https://doi.org/10.1117/12.2677195
Event: SPIE Optical Metrology, 2023, Munich, Germany

Abstract

To achieve high accuracy and precision in optical metrology for advanced semiconductors, it is crucial to identify and compensate for errors from optical components and environmental perturbations. In this study, we investigated the sources of the errors in the interferometric ellipsometer developed for next-generation OCD. The objective lens and beam splitters, the critical optical components of the system, are intensively investigated. The system errors induced by temperature fluctuation, wavelength inaccuracy, and defocus were quantitatively examined. We also proposed methods for compensating individual errors and analyzed the effect of the compensation. As a result of error compensation, the accuracy and precision of the system is improved by 6.9 times and 2.3 times, respectively. Although the investigation was conducted based on our interferometric ellipsometry system, the finding is not limited to this system, as these errors are commonly found in most optical metrology systems. The proposed method for error compensation will be essential strategies for various ellipsometry systems suffering from a low level of accuracy and precision.

Conference Presentation

Citation Download Citation

Seungwoo Lee, Yeeun Park, Seungryeol Lee, Hoonchul Chang, Jaehwang Jung, Inho Shin, Seoyeon Jeong, Sooyeong Lee, Jinwoo Ahn, Taejoong Kim, Taeyong Jo, and Myungjun Lee "Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry", Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, 126180B (15 August 2023); https://doi.org/10.1117/12.2677195

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available