Dr. Taeyong Jo Profile

Dr. Taeyong Jo

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 15 August 2023 Presentation + Paper

Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry

Seungwoo Lee, Yeeun Park, Seungryeol Lee, Hoonchul Chang, Jaehwang Jung, Inho Shin, Seoyeon Jeong, Sooyeong Lee, Jinwoo Ahn, Taejoong Kim, Taeyong Jo, Myungjun Lee

Proceedings Volume 12618, 126180B (2023) https://doi.org/10.1117/12.2677195

KEYWORDS: Objectives, Beam splitters, Polarization, Temperature metrology, Ellipsometry, Error analysis, Optical components

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Proceedings Article | 27 April 2023 Poster + Paper

Exploiting spatial characteristic of wafer for effective OCW: area partitioning OCW

Gilwoo Song, Dooho Kang, Sungchai Kim, Sungwon Park, Taeyong Jo, Euiseok Kum, Jonghyun Lee, Dooho Park, Dongmin Kim, Sungwoon Uh, Jaehyung Kim

Proceedings Volume 12496, 124963N (2023) https://doi.org/10.1117/12.2670089

KEYWORDS: Deformation, Semiconducting wafers, Overlay metrology, Control systems, Optical alignment, Lithography, Machine learning

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Proceedings Article | 26 May 2022 Poster + Paper

Reduction in on-product overlay random error using machine learning algorithm

Gilwoo Song, Sungchai Kim, Sungwon Park, Taeyoung Jo, Euiseok Kum, Jonghyun Hwang, Seonho Lee

Proceedings Volume 12053, 120531O (2022) https://doi.org/10.1117/12.2612771

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical parametric oscillators, Scanners, Metrology, Machine learning, Neural networks, Error analysis, Semiconductors, Process control

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Proceedings Article | 20 June 2021 Presentation + Paper

Machine learning aided profile measurement in high-aspect-ratio nanostructures

Inho Kim, Yoonsung Bae, Seoungho Gwak, Euiseok Kum, Taeyong Jo

Proceedings Volume 11783, 117830K (2021) https://doi.org/10.1117/12.2592282

KEYWORDS: Nanostructures, Data modeling, Machine learning, Scanning electron microscopy, 3D modeling, Signal processing, Semiconductors, Performance modeling, Nondestructive evaluation, Image processing

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Proceedings Article | 17 March 2021 Presentation + Paper

Machine learning aided process control: critical dimension uniformity control of etching process in 1z nm DRAM

Taeyong Jo, Insoo Choi, Doocheol Choi, Yoonsung Bae, Seunggun Byoun, Inho Kim, Sukwon Lee, Changhoon Choi, Euiseok Kum, Youngil Kang, Taejoong Kim, Youngjoo Lee

Proceedings Volume 11611, 116111L (2021) https://doi.org/10.1117/12.2583473

KEYWORDS: Process control, Etching, Machine learning, Semiconductors, Cadmium, Temperature metrology, Semiconducting wafers, Neural networks, Metrology, Artificial neural networks

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