Innovative Cr shrinking to improve tritone mask process and inspectability

Decai Liao; Wei Gan; Zhengzhou Tian; Zijun Zhong; Ren Bao; Haiming Ge; Shizhang Zhuang; Tianguo Deng; Yanghui Liu

doi:10.1117/12.3034582

20 November 2024 Innovative Cr shrinking to improve tritone mask process and inspectability

Decai Liao, Wei Gan, Zhengzhou Tian, Zijun Zhong, Ren Bao, Haiming Ge, Shizhang Zhuang, Tianguo Deng, Yanghui Liu

Proceedings Volume 13216, Photomask Technology 2024; 132162A (2024) https://doi.org/10.1117/12.3034582
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

For mature technology node IC manufacturing, a simple Tritone mask is widely adopted with chrome (Cr) layer remained in Scribe line and border region. The fabrication of a Tritone mask uses a dual step process with an e-beam writer for the 1st writing and a laser beam writer for the 2nd one, which induces process shift and possible Cr residual defects of the 2nd exposure writing. In this paper, NewRay Mask Technology Corporation (NRMTC) proposes a new process with adequate Cr shrinking, which can decrease residual Cr on Mosi/Qz edge when the mask is inspected and qualified on the KLA TeraScan™ 597XRS mask inspection system with Tritone Die-to-Database inspection mode. Furthermore, we have illustrated two main factors that contributed to Cr shrinking and figured out the optimal shrinking distance based on Cr line residue analysis and registration results. Production mask verification also conducted with optimal Cr shrink distance, demonstrates that optimal Cr shrinking distance can effectively improve the defect inspection process and have extra benefits on Tritone mask inspectability.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Decai Liao, Wei Gan, Zhengzhou Tian, Zijun Zhong, Ren Bao, Haiming Ge, Shizhang Zhuang, Tianguo Deng, and Yanghui Liu "Innovative Cr shrinking to improve tritone mask process and inspectability", Proc. SPIE 13216, Photomask Technology 2024, 132162A (20 November 2024); https://doi.org/10.1117/12.3034582

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