Production-ready 2-kHz KrF excimer laser for DUV lithography

Dave Myers; Tom A. Watson; Palash P. Das; Gunasiri G. Padmabandu; Paolo Zambon; Thomas Hofmann; William N. Partlo; Christopher Hysham; Richard Dunning

doi:10.1117/12.354309

26 July 1999 Production-ready 2-kHz KrF excimer laser for DUV lithography

Dave Myers, Tom A. Watson, Palash P. Das, Gunasiri G. Padmabandu, Paolo Zambon, Thomas Hofmann, William N. Partlo, Christopher Hysham, Richard Dunning

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354309
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Now that 1000 Hz KrF excimer laser based DUV lithography tools are firmly established in production, emphasis is shifting from development towards improving the productivity and profitability of the manufacturing process, thereby reducing the cost per wafer. In this arena, laser manufacturers are competing now not only on performance but also on cost and productivity enhancements that the laser can offer to the lithography process.

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Dave Myers, Tom A. Watson, Palash P. Das, Gunasiri G. Padmabandu, Paolo Zambon, Thomas Hofmann, William N. Partlo, Christopher Hysham, and Richard Dunning "Production-ready 2-kHz KrF excimer laser for DUV lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354309

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