Refractive and diffractive x-ray optical elements

Irina Snigireva; Anatoly A. Snigirev; Serguei Kuznetsov; Christoph Rau; Timm Weitkamp; Leonid Shabelnikov; Michail Grigoriev; Vecheslav Yunkin; Martin Hoffmann; Edgar I. Voges

doi:10.1117/12.450223

13 December 2001 Refractive and diffractive x-ray optical elements

Irina Snigireva, Anatoly A. Snigirev, Serguei Kuznetsov, Christoph Rau, Timm Weitkamp, Leonid Shabelnikov, Michail Grigoriev, Vecheslav Yunkin, Martin Hoffmann, Edgar I. Voges

Author Affiliations +

Proceedings Volume 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II; (2001) https://doi.org/10.1117/12.450223
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

The planar microelectronics technology, involving lithography and highly anisotropic plasma etching techniques, allows manufacturing high quality refractive and diffractive lenses, which may be used in hard X-ray microprobe and microscopy applications. These silicon lenses are mechanically robust and can withstand high beat load of the white X-ray beam at third generation synchrotron radiation sources. For the first time we designed and manufactured a new type of lenses: kinoform lenses and parabolic lenses with scaled reduction of curvature radii. The theoretical background for such type of lens features is presented. Focusing properties in the terms of focus spot and efficiency of all these lenses were tested at the ESRF beamlines. Magnified imaging with planar lense was realized. Some future developments are discussed.

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Irina Snigireva, Anatoly A. Snigirev, Serguei Kuznetsov, Christoph Rau, Timm Weitkamp, Leonid Shabelnikov, Michail Grigoriev, Vecheslav Yunkin, Martin Hoffmann, and Edgar I. Voges "Refractive and diffractive x-ray optical elements", Proc. SPIE 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II, (13 December 2001); https://doi.org/10.1117/12.450223

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