High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F2 and KrF excimer lasers

Kotaro Obata; Koji Sugioka; Tatsuya Kono; Hiroshi Takai; Koichi Toyoda; Katsumi Midorikawa

doi:10.1117/12.497735

19 February 2003 High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F₂ and KrF excimer lasers

Kotaro Obata, Koji Sugioka, Tatsuya Kono, Hiroshi Takai, Koichi Toyoda, Katsumi Midorikawa

Author Affiliations +

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.497735
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

A multiwavelength excitation process using F₂ and KrF excimer lasers for high-efficiency and high-speed refractive index modification of fused silica is demonstrated. We find that this process is essentially superior to conventional single-wavelength F₂ laser processing. The multiwavelength excitation process achieves twice of diffraction efficiency compared with that of single-wavelength F₂ laser irradiation sample at the same number of total photons supplied to the sample. This high-speed and high-efficiency modification is realized within ±50 ns of the delay time of each laser beam irradiation. In addition, the refractive index change of the multiwavelength sample was increased to 8.2×10^-3, which is 1.78 times larger than that of single-wavelength F₂ laser irradiation sample at same irradiation time. This superiority of the wavelength excitation process is attributed to resonance photoionization-like process based on excited state absorption in fused silica.

Citation Download Citation

Kotaro Obata, Koji Sugioka, Tatsuya Kono, Hiroshi Takai, Koichi Toyoda, and Katsumi Midorikawa "High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F₂ and KrF excimer lasers", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.497735

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Excimer lasers

Silica

Photons

Diffraction

Refractive index

Laser irradiation

Electrons

Show All Keywords

Keywords/Phrases

Search In:

Publication Years