Nikon EB stepper: its system design and preliminary performance

Noriyuki Hirayanagi; Tomoharu Fujiwara; Kazunari Hada; Toshimasa Shimoda; Kazuaki Suzuki

doi:10.1117/12.484972

16 June 2003 Nikon EB stepper: its system design and preliminary performance

Noriyuki Hirayanagi, Tomoharu Fujiwara, Kazunari Hada, Toshimasa Shimoda, Kazuaki Suzuki

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484972
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Electron Projection Lithography (EPL) has a high potential for applicability beyond the ITRS 65 nm node, especially for contacts and gate layers. The concept of synchronization control of the Nikon EB stepper is explained. The reticle stage and the wafer stage are servo controlled to target positions individually. The residual stage position errors are compensated by the electron beam deflection control. The electron beam deflection is feed forward controlled using predicted stage position data from a subsystem called “Filter/Predictor”. The performance of the stage position prediction of the Filter/Predictor is described. This paper also reports the performance of the first EB stepper tool, the NSR-EB1A, during its preliminary adjustment phase. Dynamic scanning and stitching exposure, which requires synchronization of both the beam deflection motion and the stage scanning motion, was realized. Dynamic resolution of 100 nm and dynamic subfield stitching accuracy of 25 nm (3sigma) were obtained, and further improvement is expected.

Citation Download Citation

Noriyuki Hirayanagi, Tomoharu Fujiwara, Kazunari Hada, Toshimasa Shimoda, and Kazuaki Suzuki "Nikon EB stepper: its system design and preliminary performance", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484972

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