Experimental characterization of constituent errors in electron-beam lithography

Russell Cinque; Peter Buck; Kyungsoo S. Yeo; Tadashi Komagata; Yasutoshi Nakagawa

doi:10.1117/12.681748

20 May 2006 Experimental characterization of constituent errors in electron-beam lithography

Russell Cinque, Peter Buck, Kyungsoo S. Yeo, Tadashi Komagata, Yasutoshi Nakagawa

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62831M (2006) https://doi.org/10.1117/12.681748
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

The composite critical dimension (CD) and registration performance of a photomask is limited partly by systematic constituent mask lithography tool errors. Test masks can be designed specifically to isolate these error sources so they can be measured and characterized independently from other error sources. This methodology allows the creation of a composite CD and registration error budget that can be used to realistically specify mask lithography tool requirements and predict actual performance on masks from these tools. In this study, we investigate the local CD and Registration errors that occur within a single deflection field on the JEOL JBX-9000MV vector shaped beam (VSB) electron-beam mask lithography system. Test patterns were designed to hold proximity, fogging, and loading effects constant and thereby show the true constituent error of the system. One advantage of using the JBX-9000MV in this study is that the step-and-repeat stage motion makes the position of each feature within the deflection field unambiguous compared to other VSB tools that use continuous stage motion. It is therefore relatively straightforward to characterize and compensate deflection errors. The authors will present experimental characterization of the constituent errors observed within a single deflection field. In addition, we will show how these errors can be controlled through increased shot settling time, increased deflection calibration, and multi-pass writing.

Citation Download Citation

Russell Cinque, Peter Buck, Kyungsoo S. Yeo, Tadashi Komagata, and Yasutoshi Nakagawa "Experimental characterization of constituent errors in electron-beam lithography", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831M (20 May 2006); https://doi.org/10.1117/12.681748

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