Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan; Leonid Yankulin; Alin Antohe; Rashi Garg; Petros Thomas; Chimaobi Mbanaso; Andrea Wüest; Frank Goodwin; Sungmin Huh; Patrick Naulleau; Kenneth Goldberg; Iacopo Mochi; Gregory Denbeaux

doi:10.1117/12.814196

18 March 2009 Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713U (2009) https://doi.org/10.1117/12.814196
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMATECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMATECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

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Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, and Gregory Denbeaux "Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713U (18 March 2009); https://doi.org/10.1117/12.814196

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