Dr. Yu-Jen Fan Profile

Dr. Yu-Jen Fan

at ASML

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 4 April 2016 Paper

Benchmarking study of EUV resists for NXE:3300B

Yu-Jen Fan, Mac Mellish, Jun Sung Chun, Scott McWilliams, Cecilia Montgomery, Warren Montgomery

Proceedings Volume 9776, 97760W (2016) https://doi.org/10.1117/12.2222065

KEYWORDS: Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Etching, Neodymium, Optical lithography, Photoresist developing, Lithography, Semiconducting wafers, Scanners

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Proceedings Article | 20 March 2015 Paper

Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality

Cecilia Montgomery, Jun Sung Chun, Yu-Jen Fan, Shih-Hui Jen, Mark Neisser, Kevin Cummings, Warren Montgomery, Takashi Saito, Lior Huli, David Hetzer, Hiroie Matsumoto, Andrew Metz, Vinayak Rastogi

Proceedings Volume 9425, 942526 (2015) https://doi.org/10.1117/12.2086982

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist processing, Line width roughness, Photoresist materials, Lithography, Optical lithography, Critical dimension metrology, Double patterning technology

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Proceedings Article | 16 March 2015 Paper

Novel resist approaches to enable EUV lithography in high volume manufacturing and extensions to future nodes

Mark Neisser, Kevin Cummings, Sean Valente, Cecilia Montgomery, Yu-Jen Fan, Ken Matthews, JunSung Chun, Paul Ashby

Proceedings Volume 9422, 94220L (2015) https://doi.org/10.1117/12.2086307

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Chemically amplified resists, Line width roughness, Electrons, Photons, Molecules, Photoresist materials, Metals

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Proceedings Article | 16 March 2015 Paper

First results of outgas resist family test and correlation between outgas specifications and EUV resist development

Yu-Jen Fan, Ken Maruyama, Ramakrishnan Ayothi, Takehiko Naruoka, Tonmoy Chakraborty, Dominic Ashworth, Jun Sung Chun, Cecilia Montgomery, Shih-Hui Jen, Mark Neisser, Kevin Cummings

Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424

KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

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Proceedings Article | 13 March 2015 Paper

Collaborative work on reducing the intersite gaps in outgassing qualification

Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, Dominic Ashworth

Proceedings Volume 9422, 942212 (2015) https://doi.org/10.1117/12.2085700

KEYWORDS: Semiconducting wafers, Contamination, Picosecond phenomena, Temperature metrology, Extreme ultraviolet, Molecules, Extreme ultraviolet lithography, Electron beams, Standards development, Lithography

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Proceedings Article | 17 April 2014 Paper

AIS wavefront sensor: a robust optical test of exposure tools using localized wavefront curvature

Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Greg Denbeaux, Yudhi Kandel, Patrick Naulleau

Proceedings Volume 9048, 90483A (2014) https://doi.org/10.1117/12.2048389

KEYWORDS: Artificial intelligence, Sensors, Reticles, Optical testing, Wavefronts, Wavefront sensors, Prototyping, Photomasks, Zernike polynomials, X-ray optics

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Proceedings Article | 17 April 2014 Paper

Direct measurement of carbon contamination topography on patterned EUV masks

Yu-Jen Fan, Thomas Murray, Frank Goodwin, Dominic Ashworth, Gregory Denbeaux

Proceedings Volume 9048, 90480O (2014) https://doi.org/10.1117/12.2048092

KEYWORDS: Contamination, Extreme ultraviolet, Photomasks, Carbon, Transmission electron microscopy, Extreme ultraviolet lithography, Photons, Silicon, Semiconducting wafers, Ruthenium

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Proceedings Article | 17 April 2014 Paper

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm

Proceedings Volume 9048, 90481M (2014) https://doi.org/10.1117/12.2046380

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Projection systems, Lithography, Reticles, Cameras, Artificial intelligence, Optical lithography, Wavefronts, Sensors

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Proceedings Article | 1 April 2013 Paper

Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing

Mihir Upadhyaya, Yudhishthir Kandel, Gregory Denbeaux, Cecilia Montgomery, Yu-Jen Fan

Proceedings Volume 8679, 867934 (2013) https://doi.org/10.1117/12.2018629

KEYWORDS: Electrons, X-rays, Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Semiconducting wafers, Wafer-level optics, Gold, Reflectivity, Statistical analysis

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Proceedings Article | 1 April 2013 Paper

In situ optical testing of exposure tools via localized wavefront curvature sensing

Ryan Miyakawa, Xibin Zhou, Michael Goldstein, Dominic Ashworth, Kevin Cummings, Yu-Jen Fan, Yashesh Shroff, Gregory Denbeaux, Yudhi Kandel, Patrick Naulleau

Proceedings Volume 8679, 86790Q (2013) https://doi.org/10.1117/12.2013880

KEYWORDS: Optical testing, Wavefronts, Condition numbers, Sensors, Reticles, Zernike polynomials, Interferometry, X-ray optics, Wavefront sensors, Photomasks

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Proceedings Article | 8 April 2011 Paper

Dependence of contamination rates on key parameters in EUV optics

Yashdeep Khopkar, Petros Thomas, Leonid Yankulin, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Mihir Upadhyaya, Vimal Kumar Kamineni, Yu-Jen Fan, Gregory Denbeaux, Vibhu Jindal, Andrea Wüest, Eric Gullikson

Proceedings Volume 7969, 796923 (2011) https://doi.org/10.1117/12.879491

KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2010 Paper

Wavelength dependence of carbon contamination on mirrors with different capping layers

Petros Thomas, Leonid Yankulin, Yashdeep Khopkar, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Yu-Jen Fan, Gregory Denbeaux, Samir Aouadi, Vibhu Jindal, Andrea Wüest

Proceedings Volume 7636, 76361X (2010) https://doi.org/10.1117/12.847015

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Mirrors, Extreme ultraviolet lithography, Xenon, Error analysis, Neodymium, Ruthenium, Titanium dioxide

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Proceedings Article | 20 March 2010 Paper

Carbon contamination topography analysis of EUV masks

Yu-Jen Fan, Leonid Yankulin, Petros Thomas, Chimaobi Mbanaso, Alin Antohe, Rashi Garg, Yunfei Wang, Thomas Murray, Andrea Wüest, Frank Goodwin, Sungmin Huh, Aaron Cordes, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Eric Gullikson, Gregory Denbeaux

Proceedings Volume 7636, 76360G (2010) https://doi.org/10.1117/12.846996

KEYWORDS: Carbon, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Printing, Scanning electron microscopy, Inspection, Lithography

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Proceedings Article | 18 March 2009 Paper

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

Proceedings Volume 7271, 72713U (2009) https://doi.org/10.1117/12.814196

KEYWORDS: Photomasks, Contamination, Carbon, Extreme ultraviolet, Scanning electron microscopy, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Reflectivity

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Proceedings Article | 18 March 2009 Paper

EUV resist outgassing: scaling to HVM intensity

Alin Antohe, Chimaobi Mbanaso, Yu-Jen Fan, Leonid Yankulin, Rashi Garg, Petros Thomas, Gregory Denbeaux, Emil Piscani, Andrea Wuest

Proceedings Volume 7271, 727126 (2009) https://doi.org/10.1117/12.816555

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Photoresist materials, Polymethylmethacrylate, Spectroscopy, Semiconducting wafers, Polymers, EUV optics, Photons

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Proceedings Article | 28 March 2008 Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Gregory Denbeaux, Rashi Garg, Chimaobi Mbanaso, Justin Waterman, Leonid Yankulin, Alin Antohe, Yu-Jen Fan, Warren Montgomery, Kim Dean, Kevin Orvek, Andrea Wüest, Yayi Wei, Frank Goodwin, Obert Wood, Chiew-Seng Koay, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham, Saša Bajt

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 3 May 2007 Paper

Quantitative measurement of EUV resist outgassing

Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, Kim Dean

Proceedings Volume 6533, 653318 (2007) https://doi.org/10.1117/12.737192

KEYWORDS: Spectroscopy, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Optical filters, Xenon, Molecular spectroscopy, Calibration, Photoresist materials, Mirrors

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Showing 5 of 17 publications

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