Mr. Chimaobi Mbanaso Profile

Chimaobi Mbanaso

Ph.D. Student at SUNY CNSE/SUNYIT

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Author

Publications (12)

SPIE Journal Paper | 10 May 2012

Out-of-band radiation mitigation at 10.6 μm by molecular absorbers in laser-produced plasma extreme ultraviolet sources

Chimaobi Mbanaso, Alin Antohe, Horace Bull, Gregory Denbeaux, Frank Goodwin, Ady Hershcovitch

JM3, Vol. 11, Issue 02, 021116, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021116

KEYWORDS: Absorption, Gas lasers, Molecules, Infrared radiation, Extreme ultraviolet, Carbon monoxide, Photons, Optical filters, Plasma, Molecular lasers

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Proceedings Article | 8 April 2011 Paper

Dependence of contamination rates on key parameters in EUV optics

Yashdeep Khopkar, Petros Thomas, Leonid Yankulin, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Mihir Upadhyaya, Vimal Kumar Kamineni, Yu-Jen Fan, Gregory Denbeaux, Vibhu Jindal, Andrea Wüest, Eric Gullikson

Proceedings Volume 7969, 796923 (2011) https://doi.org/10.1117/12.879491

KEYWORDS: Contamination, Carbon, Extreme ultraviolet, Ruthenium, EUV optics, Polymers, Polymerization, Polymer thin films, Mirrors, Extreme ultraviolet lithography

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Proceedings Article | 8 April 2011 Paper

Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation

Chimaobi Mbanaso, Seth Kruger, Craig Higgins, Yashdeep Khopkar, Alin Antohe, Brian Cardineau, Gregory Denbeaux

Proceedings Volume 7969, 79692J (2011) https://doi.org/10.1117/12.879507

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Photoresist materials, Spectroscopy, Lithography, Polymer thin films, Diffusion, Surface conduction electron emitter displays, Ultraviolet radiation

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Proceedings Article | 29 March 2011 Paper

Gas-based spectral filter for mitigating 10.6 um radiation in CO2 laser produced plasma extreme ultraviolet sources

Chimaobi Mbanaso, Gregory Denbeaux, Alin Antohe, Horace Bull, Frank Goodwin, Ady Hershcovitch

Proceedings Volume 7969, 796909 (2011) https://doi.org/10.1117/12.879550

KEYWORDS: Absorption, Infrared radiation, Extreme ultraviolet, Carbon dioxide lasers, Molecules, Optical filters, Photons, Plasma, Extreme ultraviolet lithography, Gases

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Proceedings Article | 23 March 2010 Paper

Wavelength dependence of carbon contamination on mirrors with different capping layers

Petros Thomas, Leonid Yankulin, Yashdeep Khopkar, Rashi Garg, Chimaobi Mbanaso, Alin Antohe, Yu-Jen Fan, Gregory Denbeaux, Samir Aouadi, Vibhu Jindal, Andrea Wüest

Proceedings Volume 7636, 76361X (2010) https://doi.org/10.1117/12.847015

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Mirrors, Extreme ultraviolet lithography, Xenon, Error analysis, Neodymium, Ruthenium, Titanium dioxide

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Proceedings Article | 20 March 2010 Paper

Carbon contamination topography analysis of EUV masks

Yu-Jen Fan, Leonid Yankulin, Petros Thomas, Chimaobi Mbanaso, Alin Antohe, Rashi Garg, Yunfei Wang, Thomas Murray, Andrea Wüest, Frank Goodwin, Sungmin Huh, Aaron Cordes, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Eric Gullikson, Gregory Denbeaux

Proceedings Volume 7636, 76360G (2010) https://doi.org/10.1117/12.846996

KEYWORDS: Carbon, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectivity, Printing, Scanning electron microscopy, Inspection, Lithography

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Proceedings Article | 18 March 2009 Paper

EUV resist outgassing: scaling to HVM intensity

Alin Antohe, Chimaobi Mbanaso, Yu-Jen Fan, Leonid Yankulin, Rashi Garg, Petros Thomas, Gregory Denbeaux, Emil Piscani, Andrea Wuest

Proceedings Volume 7271, 727126 (2009) https://doi.org/10.1117/12.816555

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Molecules, Photoresist materials, Polymethylmethacrylate, Spectroscopy, Semiconducting wafers, Polymers, EUV optics, Photons

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Proceedings Article | 18 March 2009 Paper

Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging

Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Rashi Garg, Petros Thomas, Chimaobi Mbanaso, Andrea Wüest, Frank Goodwin, Sungmin Huh, Patrick Naulleau, Kenneth Goldberg, Iacopo Mochi, Gregory Denbeaux

Proceedings Volume 7271, 72713U (2009) https://doi.org/10.1117/12.814196

KEYWORDS: Photomasks, Contamination, Carbon, Extreme ultraviolet, Scanning electron microscopy, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Reflectivity

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Proceedings Article | 28 March 2008 Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Gregory Denbeaux, Rashi Garg, Chimaobi Mbanaso, Justin Waterman, Leonid Yankulin, Alin Antohe, Yu-Jen Fan, Warren Montgomery, Kim Dean, Kevin Orvek, Andrea Wüest, Yayi Wei, Frank Goodwin, Obert Wood, Chiew-Seng Koay, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham, Saša Bajt

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 21 March 2008 Paper

Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation

Chimaobi Mbanaso, Gregory Denbeaux, Kim Dean, Robert Brainard, Seth Kruger, Elsayed Hassanein

Proceedings Volume 6921, 69213L (2008) https://doi.org/10.1117/12.772695

KEYWORDS: Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Photoresist materials, Lithography, Semiconducting wafers, Light, Absorbance, Image quality, Reflectivity

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Proceedings Article | 20 March 2008 Paper

Quantitative measurement of outgas products from EUV photoresists

C. Tarrio, B. Benner, R. Vest, S. Grantham, S. Hill, T. Lucatorto, J. Hendricks, P. Abbott, G. Denbeaux, C. Mbanaso, A. Antohe, K. Orvek, K.-W. Choi

Proceedings Volume 6921, 69211H (2008) https://doi.org/10.1117/12.772686

KEYWORDS: Semiconducting wafers, Molecules, Extreme ultraviolet lithography, Photoresist materials, Statistical analysis, Extreme ultraviolet, Capacitance, EUV optics, Mass spectrometry, Chemical analysis

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Proceedings Article | 3 May 2007 Paper

Quantitative measurement of EUV resist outgassing

Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, Kim Dean

Proceedings Volume 6533, 653318 (2007) https://doi.org/10.1117/12.737192

KEYWORDS: Spectroscopy, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Optical filters, Xenon, Molecular spectroscopy, Calibration, Photoresist materials, Mirrors

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Showing 5 of 12 publications

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