Inverse vs. traditional OPC for the 22nm node

James Word; Yuri Granik; Marina Medvedeva; Sergei Rodin; Luigi Capodieci; Yunfei Deng; Jongwook Kye; Cyrus Tabery; Kenji Yoshimoto; Yi Zou; Hesham Diab; Mohamed Gheith; Mohamed Habib; Cynthia Zhu

doi:10.1117/12.814339

16 March 2009 Inverse vs. traditional OPC for the 22nm node

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, Cynthia Zhu

Author Affiliations +

Proceedings Volume 7274, Optical Microlithography XXII; 72743A (2009) https://doi.org/10.1117/12.814339
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The 22nm node will be patterned with very challenging Resolution Enhancement Techniques (RETs) such as double exposure or double patterning. Even with those extreme RETs, the k1 factor is expected to be less than 0.3. There is some concern in the industry that traditional edge-based simulate-then-move Optical Proximity Correction (OPC) may not be up to the challenges expected at the 22nm node. Previous work presented the advantages of a so-called inverse OPC approach when coupled with extreme RETs or illumination schemes. The smooth mask contours resulting from inverse corrections were shown not to be limited by topological identity, feedback locality, or fragment conformity. In short, inverse OPC can produce practically unconstrained and often non-intuitive mask shapes. The authors will expand this comparison between traditional and inverse OPC to include likely 22nm RETs such as double dipole lithography and double patterning, comparing dimensional control through process window for each OPC method. The impact of mask simplification of the inverse OPC shapes into shapes which can be reliably manufactured will also be explored.

Citation Download Citation

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, and Cynthia Zhu "Inverse vs. traditional OPC for the 22nm node", Proc. SPIE 7274, Optical Microlithography XXII, 72743A (16 March 2009); https://doi.org/10.1117/12.814339

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available