Fabrication of a new type of transmission grating with holography interferometry and wet anisotropic etching

Yong Chen; Keqiang Qiu; Xiangdong Xu; Yilin Hong; Zhenkun Liu; Ying Liu; Shaojun Fu

doi:10.1117/12.971424

15 October 2012 Fabrication of a new type of transmission grating with holography interferometry and wet anisotropic etching

Yong Chen, Keqiang Qiu, Xiangdong Xu, Yilin Hong, Zhenkun Liu, Ying Liu, Shaojun Fu

Author Affiliations +

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84180O (2012) https://doi.org/10.1117/12.971424
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

As a new type of grating, the freestanding blazed transmission grating combines the advantages of traditional transmission gratings (low mass, relaxed alignment and flatness figure insensitivity) with those of reflection gratings (high broadband diffraction efficiency, high spectral resolution). A freestanding blazed transmission grating with period of 1μm was successfully fabricated by holographic lithography and anisotropic wet etching of silicon. The duty cycle is about 0.13. The aspect ratio of a single grating bar is about 77. The thickness is 10μm and the open area fraction is about 58.8%. The size of a single die is 15mm×15mm divided into four 5mm ×5mm windows. The diffraction efficiency of the grating was measured at the National Synchrotron Radiation Laboratory in the wavelength region of 5-50nm. The results show a strong blazing effect in the direction of specular reflection from mirror-like grating sidewalls, as expected.

Citation Download Citation

Yong Chen, Keqiang Qiu, Xiangdong Xu, Yilin Hong, Zhenkun Liu, Ying Liu, and Shaojun Fu "Fabrication of a new type of transmission grating with holography interferometry and wet anisotropic etching", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180O (15 October 2012); https://doi.org/10.1117/12.971424

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KEYWORDS

Diffraction gratings

Photomasks

Silicon

Etching

Holography

Diffraction

Wet etching

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