A study of swing-curve physics in diffraction-based overlay

Kaustuve Bhattacharyya; Arie den Boef; Greet Storms; Joost van Heijst; Marc Noot; Kevin An; Noh-Kyoung Park; Se-Ra Jeon; Nang-Lyeom Oh; Elliott McNamara; Frank van de Mast; SeungHwa Oh; Seung Yoon Lee; Chan Hwang; Kuntack Lee

doi:10.1117/12.2222040

24 March 2016 A study of swing-curve physics in diffraction-based overlay

Kaustuve Bhattacharyya, Arie den Boef, Greet Storms, Joost van Heijst, Marc Noot, Kevin An, Noh-Kyoung Park, Se-Ra Jeon, Nang-Lyeom Oh, Elliott McNamara, Frank van de Mast, SeungHwa Oh, Seung Yoon Lee, Chan Hwang, Kuntack Lee

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97781I (2016) https://doi.org/10.1117/12.2222040
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection.

In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.

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Kaustuve Bhattacharyya, Arie den Boef, Greet Storms, Joost van Heijst, Marc Noot, Kevin An, Noh-Kyoung Park, Se-Ra Jeon, Nang-Lyeom Oh, Elliott McNamara, Frank van de Mast, SeungHwa Oh, Seung Yoon Lee, Chan Hwang, and Kuntack Lee "A study of swing-curve physics in diffraction-based overlay", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781I (24 March 2016); https://doi.org/10.1117/12.2222040

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