Investigation of ZrSi2 for application to EUV pellicle

Seong Ju Wi; Chang Soo Kim; Haneul Kim; Jaehyuck Choi; Kyoung-Won Seo; Jinho Ahn

doi:10.1117/12.2641822

11 November 2022 Investigation of ZrSi₂ for application to EUV pellicle

Seong Ju Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, Jinho Ahn

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920G (2022) https://doi.org/10.1117/12.2641822
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

To boost the productivity of extreme ultraviolet (EUV) lithography, the development of an EUV pellicle that not only has excellent optical properties such as high EUV transmittance and low reflectance but also can withstand high-power EUV light sources is in progress. In this paper, zirconium silicide (ZrSi2)-based pellicles were fabricated and optical, mechanical, and thermal properties were evaluated to verify their applicability to EUV pellicle materials. ZrSi2 composite pellicle was fabricated by depositing ZrSi2 on a silicon nitride (SiNx) free-standing membrane. The heat load test that emulates EUV exposure conditions was performed to evaluate the thermal properties. The optical and mechanical properties were evaluated by an EUV microscope and bulge test, respectively. As a result of the thermal load test, the emissivity of ZrSi2 was measured to be 0.18-0.29 at a ZrSi2 thickness of 10-40 nm, and the emissivity increased as the thickness increased. The ZrSi2-based pellicle of Si/ZrSi2/SiNx structure meets optical requirements with EUV transmittance and EUV reflectance of 92.7% and 0.04% or less, respectively. In addition, the ultimate tensile strength (UTS) of this composite pellicle was measured to be about 3.5 GPa. From these results, it is expected that ZrSi2 can be used as an EUV pellicle material.

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Citation Download Citation

Seong Ju Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, and Jinho Ahn "Investigation of ZrSi₂ for application to EUV pellicle", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920G (11 November 2022); https://doi.org/10.1117/12.2641822

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KEYWORDS

Extreme ultraviolet

Pellicles

EUV optics

Composites

Extreme ultraviolet lithography

Optical fabrication

Reflectivity

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