Mr. Ha Neul Kim Profile

Ha Neul Kim

at Hanyang Univ

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 12 November 2024 Presentation + Paper

Multilayered EUV pellicle: enhanced mechanical strength and thermal stability

Young Woo Kang, Ha Neul Kim, Taeho Lee, Young Wook Park, Jinho Ahn

Proceedings Volume 13215, 132150D (2024) https://doi.org/10.1117/12.3034680

KEYWORDS: Extreme ultraviolet, Pellicles, Multilayers, Transmittance, Emissivity, Reflectivity, Thermal stability

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Proceedings Article | 12 November 2024 Poster + Paper

Development of a porous patterned membrane with a large field size for EUV pellicles

Tae Joong Ha, Gi-sung Lee, Haneul Kim, Jungyeon Kim, Jinho Ahn

Proceedings Volume 13215, 132150V (2024) https://doi.org/10.1117/12.3033641

KEYWORDS: Porosity, Etching, Silicon, Pellicles, Extreme ultraviolet, Transmittance, Silicon nitride, Dry etching, Surface roughness, Semiconductors, Wet etching

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Proceedings Article | 10 April 2024 Poster + Paper

A novel solution for next-generation EUV pellicle: breathable membrane with increased transmittance

Haneul Kim, Jungyeon Kim, Young-Woo Kang, Min-woo Kim, Tae Joong Ha, Gi Sung Lee, Hye-Keun Oh, Jinho Ahn

Proceedings Volume 12953, 129531B (2024) https://doi.org/10.1117/12.3011123

KEYWORDS: Pellicles, Porosity, Transmittance, Extreme ultraviolet, Simulations, Film thickness, Lithography, Extreme ultraviolet lithography, Finite element methods, Critical dimension metrology

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Proceedings Article | 14 April 2023 Poster

Impact of MoSi2 crystal structure on nano-membrane emissivity

Haneul Kim, Seong Ju Wi, Young-Woo Kang, Won Jin Kim, Jinho Ahn

Proceedings Volume PC12494, PC124940L (2023) https://doi.org/10.1117/12.2658601

KEYWORDS: Crystals, Pellicles, Extreme ultraviolet, Annealing, Extreme ultraviolet lithography, Composites, Wet etching, Transmittance, Thermal modeling, Temperature metrology

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Proceedings Article | 11 November 2022 Presentation

Investigation of ZrSi2 for application to EUV pellicle

Seong Ju Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, Jinho Ahn

Proceedings Volume PC12292, PC122920G (2022) https://doi.org/10.1117/12.2641822

KEYWORDS: Extreme ultraviolet, Pellicles, EUV optics, Transmittance, Reflectivity, Optical fabrication, Extreme ultraviolet lithography, Composites, Zirconium, Thermography

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Proceedings Article | 13 June 2022 Poster

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Chang Soo Kim, Jung Hwan Kim, Seong Ju Wi, Ha Neul Kim, Young Woo Kang, Won Jin Kim, Jinho Ahn

Proceedings Volume 12051, 120510S (2022) https://doi.org/10.1117/12.2614355

KEYWORDS: Pellicles, Extreme ultraviolet, Numerical analysis, Finite element methods, Computer simulations

SPIE Journal Paper | 1 February 2022 Open Access

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 21, Issue 01, 014401, (February 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.014401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Silicon, Refractive index, Heat flux, Signal attenuation, Optical lithography, Numerical analysis

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SPIE Journal Paper | 25 May 2021

Impact of residual stress on the deflection of extreme ultraviolet pellicles

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 20, Issue 02, 024401, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.024401

KEYWORDS: Pellicles, Extreme ultraviolet, Finite element methods, Silicon, Extreme ultraviolet lithography, Structural analysis, Scanners, Protactinium, Image processing, Transmittance

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Proceedings Article | 22 February 2021 Poster + Presentation

Experimental validation of particle impact on thermo-mechanical behavior of EUV pellicle

Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, Ha Neul Kim, Jinho Ahn

Proceedings Volume 11609, 116091X (2021) https://doi.org/10.1117/12.2587398

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Proceedings Article | 20 September 2020 Presentation

Mo Silicide EUV pellicle

Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, Jinho Ahn

Proceedings Volume 11517, 115170A (2020) https://doi.org/10.1117/12.2572975

KEYWORDS: Pellicles, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Reflection, Molybdenum, Low pressure chemical vapor deposition, Silicon, Wet etching

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Showing 5 of 10 publications

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