5 June 2023 Development of deep ultraviolet optical maskless exposure tool for advanced lithography
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Abstract

Digital scanner (DS), a deep ultraviolet optical maskless exposure tool is being developed. DS uses a micromirror-type spatial light modulator to create the “mask” pattern combined with a solid-state laser with a wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid-state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application, such as large area printing and chip ID printing for security purposes, are shown.

© 2023 Society of Photo-Optical Instrumentation Engineers (SPIE)
Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Bryant Lin, Michael Tan, Sujuan Li, Stephen P. Renwick, Noriyuki Hirayanagi, and Bausan Yuan "Development of deep ultraviolet optical maskless exposure tool for advanced lithography," Journal of Micro/Nanopatterning, Materials, and Metrology 22(4), 041403 (5 June 2023). https://doi.org/10.1117/1.JMM.22.4.041403
Received: 1 December 2022; Accepted: 21 April 2023; Published: 5 June 2023
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Semiconducting wafers

Spatial light modulators

Deep ultraviolet

Optical proximity correction

UV optics

Lithography

Pulsed laser operation

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