Dr. André Egbert Profile

Dr. André Egbert

at Phoenix EUV Systems & Services GmbH

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 21 March 2008 Paper

At-wavelength reflectometry with a microfocus EUV tube

André Egbert, Stefan Becker

Proceedings Volume 6921, 69213W (2008) https://doi.org/10.1117/12.761188

KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Reflectometry, Calibration, Electrons, X-rays, Solids, Spectrographs

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Proceedings Article | 3 May 2007 Paper

Status report on EUV source development and EUV source applications in EUVL

Vivek Bakshi, Rainer Lebert, Bernhard Jägle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Guido Schriever, Christian Ziener, Marc Corthout, Joseph Pankert, Klaus Bergmann, Willi Neff, André Egbert, Deborah Gustafson

Proceedings Volume 6533, 653315 (2007) https://doi.org/10.1117/12.737183

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

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Proceedings Article | 21 March 2007 Paper

Microfocus EUV tube for at-wavelength reflectometry

André Egbert, Stefan Becker

Proceedings Volume 6517, 651739 (2007) https://doi.org/10.1117/12.706126

KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Reflectometry, Calibration, Electrons, X-rays, Solids, Spectrographs

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Proceedings Article | 24 March 2006 Paper

Advanced at-wavelength reflectometry with the EUV tube

André Egbert, Stefan Becker

Proceedings Volume 6151, 61512X (2006) https://doi.org/10.1117/12.648839

KEYWORDS: Extreme ultraviolet, Mirrors, Silicon, Metrology, Reflectometry, Calibration, Reflectivity, Solids, Electrons, X-rays

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Proceedings Article | 16 June 2005 Paper

Progress on EUV-source development, tool integration and applications

Rainer Lebert, Bernhard Jagle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Kai Gaebel, Guido Schriever, Joseph Pankert, Klaus Bergmann, Willi Neff, Andre Egbert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637333

KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

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Proceedings Article | 6 May 2005 Paper

Off-synchrotron at-wavelength EUV metrology

Andre Egbert, Stefan Becker, Boris Chichkov

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.597411

KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Calibration, Electrons, X-rays, Solids, Reflectivity, EUV optics

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Proceedings Article | 6 May 2005 Paper

Applications of an electron-based EUV source: table-top grazing incidence reflectometer and imaging with a Schwarzschild objective

U. Hinze, A. Egbert, B. Chichkov

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598743

KEYWORDS: Extreme ultraviolet, Grazing incidence, Reflectometry, Mirrors, Objectives, Reflectivity, Plasmas, Diodes, Lithography, Metrology

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Proceedings Article | 21 March 2005 Paper

Electron-based ultrashort hard x-ray source

Ulf Hinze, Andre Egbert, Boris Chichkov, Klaus Eidmann

Proceedings Volume 5714, (2005) https://doi.org/10.1117/12.593387

KEYWORDS: X-rays, Copper, Picosecond phenomena, Diodes, Femtosecond phenomena, Pulsed laser operation, Streak cameras, Laser energy, Hard x-rays, X-ray characterization

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Proceedings Article | 3 November 2004 Paper

Temporal characteristics of an electron-based ultrashort hard x-ray source

Ulf Hinze, Andre Egbert, Boris Chichkov, Klaus Eidmann

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.557157

KEYWORDS: X-rays, Copper, Picosecond phenomena, Diodes, Pulsed laser operation, Femtosecond phenomena, Streak cameras, Laser energy, Hard x-rays, X-ray sources

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Proceedings Article | 3 November 2004 Paper

Electron-based microfocus soft-x-ray source and applications

Andre Egbert, Boris Tkachenko, Stefan Becker, Boris Chichkov

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.554894

KEYWORDS: Extreme ultraviolet, Silicon, Mirrors, Metrology, Electrons, Solids, Calibration, Microscopy, Silicon carbide, X-rays

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Proceedings Article | 18 October 2004 Paper

Compact debris-free EUV source for advanced mirror metrology

Andre Egbert, Boris Tkachenko, Stefan Becker, Boris Chichkov

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.554892

KEYWORDS: Extreme ultraviolet, Mirrors, Silicon, Metrology, Electrons, Solids, Reflectivity, Beryllium, X-rays, Extreme ultraviolet lithography

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Proceedings Article | 20 September 2004 Paper

Compact electron-based EUV source for at-wavelength metrology

Andre Egbert, Boris Tkachenko, Stefan Becker, Boris Chichkov

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.547029

KEYWORDS: Extreme ultraviolet, Mirrors, Silicon, Metrology, Electrons, Solids, Semiconducting wafers, Spectrographs, Reflectivity, Silicon carbide

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Proceedings Article | 20 May 2004 Paper

Debris-free low-cost commercial EUV source for at-wavelength metrology

Andre Egbert, Boris Tkachenko, Stefan Becker, Boris Chichkov

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533019

KEYWORDS: Extreme ultraviolet, Mirrors, Silicon, Metrology, Semiconducting wafers, Spectrographs, Electrons, Silicon carbide, Optical filters, Reflectivity

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Proceedings Article | 20 May 2004 Paper

Metrology tools for EUV-source characterization and optimization

Thomas Missalla, Max Schuermann, Rainer Lebert, Christian Wies, Larissa Juschkin, Roman Klein, Frank Scholze, Gerhard Ulm, Andre Egbert, Boris Tkachenko, Boris Chichkov

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.556521

KEYWORDS: Calibration, Extreme ultraviolet, Sensors, Diodes, Metrology, Spectrographs, Optical filters, Extreme ultraviolet lithography, Transmittance, Mirrors

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Proceedings Article | 7 January 2004 Paper

Compact electron-based EUV and ultrashort hard x-ray sources

Andre Egbert, Boris Chichkov

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.499589

KEYWORDS: Extreme ultraviolet, Electrons, X-rays, Copper, Femtosecond phenomena, X-ray sources, Pulsed laser operation, Diodes, Silicon, Semiconductor lasers

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Proceedings Article | 18 November 2003 Paper

Compact electron-based EUV source

Andre Egbert, Boris Tkachenko, Andreas Ostendorf, Stefan Becker, Boris Chichkov

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.540546

KEYWORDS: Extreme ultraviolet, Silicon, Electrons, Solids, Metrology, X-rays, Beryllium, X-ray technology, Calibration, Tungsten

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Proceedings Article | 19 June 2003 Paper

High-repetition-rate compact ultrashort x-ray source and applications

Andre Egbert, Boris Chichkov

Proceedings Volume 4978, (2003) https://doi.org/10.1117/12.473188

KEYWORDS: X-rays, Electrons, Femtosecond phenomena, Copper, Photons, X-ray sources, Diodes, Semiconductor lasers, X-ray detectors, Quantum efficiency

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Proceedings Article | 16 June 2003 Paper

Compact electron-based extreme-ultraviolet source at 13.5 nm

Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Boris Chichkov, Thomas Missalla, Max Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482366

KEYWORDS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Molybdenum, Metrology, Spectrographs, Titanium

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SPIE Journal Paper | 1 April 2003

Compact electron-based extreme ultraviolet source at 13.5 nm

Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Carsten Fallnich, Boris Chichkov, Thomas Miflalla, Max Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1532350

KEYWORDS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Metrology, X-rays, X-ray technology, Extreme ultraviolet lithography

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Proceedings Article | 23 October 2002 Paper

Compact high-repetition-rate femtosecond laser-driven hard-x-ray source

Andre Egbert, Bjoern Mader, Boris Chichkov, Jean-Pierre Girardeau-Montaut

Proceedings Volume 4781, (2002) https://doi.org/10.1117/12.450405

KEYWORDS: X-rays, Femtosecond phenomena, Laser systems engineering, Pulsed laser operation, Metals, Picosecond phenomena, Diodes, X-ray sources, Copper, Quantum efficiency

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SPIE Journal Paper | 1 October 2002

Femtosecond laser-driven x-ray tube

Andre Egbert, Boris Chichkov, Carsten Fallnich, S. Zimmermann, A. Reinhold

OE, Vol. 41, Issue 10, (October 2002) https://doi.org/10.1117/12.10.1117/1.1504459

KEYWORDS: X-rays, Femtosecond phenomena, Pulsed laser operation, Quantum efficiency, Metals, Photons, X-ray sources, X-ray lasers, Plasma, Laser energy

Proceedings Article | 6 December 2001 Paper

Compact ultrashort-pulse laser-driven hard-x-ray tube

Andre Egbert, Boris Chichkov, Carsten Fallnich

Proceedings Volume 4502, (2001) https://doi.org/10.1117/12.449867

KEYWORDS: X-rays, Femtosecond phenomena, Pulsed laser operation, Metals, X-ray sources, Quantum efficiency, Plasmas, Laser energy, Laser systems engineering, Picosecond phenomena

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Proceedings Article | 1 November 1997 Paper

Development of XUV laser applications at LSAI-LULI

Gerard Jamelot, F. Albert, Alexander Belsky, Mustapha Boussoukaya, Antoine Carillon, Andre Egbert, S. Hubert, Pierre Jaegle, Denis Joyeux, I. Kamenskikh, Annie Klisnick, S. Meyer, Daniel Phalippou, David Ros, Bedrich Rus, Stephane Sebban, Bernd Wellegehausen, T. Woyvod, Philippe Zeitoun, Anne Zeitoun-Fakiris

Proceedings Volume 3156, (1997) https://doi.org/10.1117/12.284821

KEYWORDS: Luminescence, Sodium, Zinc, Mirrors, Laser applications, Plasma, Photons, Crystals, Synchrotron radiation, Interferometry

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Showing 5 of 23 publications

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