Mr. Barton A. Katz Profile

Barton A. Katz

at SoniPark LLC

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 17 May 1994 Paper

Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology

Barton Katz, Richard Rogoff, James Foster, William Rericha, J. Brett Rolfson, Richard Holscher, Craig Sager, Patrick Reynolds

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175437

KEYWORDS: Lithography, Computer aided design, Manufacturing, Photomasks, Reticles, Phase shifts, Lithium, Design for manufacturability, Binary data, Photoresist materials

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Proceedings Article | 8 August 1993 Paper

I-line lithography for subhalf-micron design rules

Barton Katz, Leif Sloan, James Foster, Richard Rogoff, Ronfu Chu, Daniel Lee

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150434

KEYWORDS: Photoresist materials, Photoresist processing, Optical lithography, Oxides, Metals, Lithography, Lens design, Photomicroscopy, Product engineering, Semiconducting wafers

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Proceedings Article | 1 June 1992 Paper

Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules

Barton Katz, James Greeneich, Richard Rogoff, Steve Slonaker, Stefan Wittekoek, Paul Luehrmann, Martin van den Brink, Douglas Ritchie

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130363

KEYWORDS: Lithography, Optical alignment, Phase shifts, Overlay metrology, Reticles, Metals, Silicon, Deep ultraviolet, Semiconducting wafers, Optical lithography

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Proceedings Article | 1 August 1991 Paper

Advanced lithographic methods for contact patterning on severe topography

Ronfu Chu, James Greeneich, Barton Katz, Hwang-Kuen Lin, Dong-Tsair Huang

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47362

KEYWORDS: Optical lithography, Photoresist processing, Lithography, Image processing, Semiconducting wafers, Standards development, X-ray lithography, X-rays, Ion beams, Manufacturing

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Proceedings Article | 1 July 1991 Paper

New 0.54 aperture i-line wafer stepper with field-by-field leveling combined with global alignment

Martin van den Brink, Barton Katz, Stefan Wittekoek

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44826

KEYWORDS: Semiconducting wafers, Sensors, Optical alignment, Optical lithography, Interferometers, Wafer-level optics, Particles, Lenses, Overlay metrology, Metrology

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Proceedings Article | 1 June 1990 Paper

High-numerical-aperture I-line stepper

Barton Katz, James Greeneich, Mark Bigelow, Ann Katz, Frits van Hout, Jos Coolsen

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20183

KEYWORDS: Semiconducting wafers, Optical alignment, Photoresist processing, Reflectivity, Signal processing, Optical lithography, Overlay metrology, Wafer-level optics, Critical dimension metrology, Image processing

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Showing 5 of 6 publications

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