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Chulgi Song
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Publications (1)
Proceedings Article | 24 March 2009 Paper
Applications of AFM in semiconductor R&D and manufacturing at 45 nm technology node and beyond
Proceedings Volume 7272, 72722R (2009) https://doi.org/10.1117/12.813389
KEYWORDS: Metrology, Atomic force microscopy, Critical dimension metrology, Silicon, Transmission electron microscopy, Transistors, Photomasks, Process control, Image processing, Optical filters
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