Dr. Dale Huang
Engineering Program Manager at ASML
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 2 April 2014 Paper
Nadine Alexis, Chris Bencher, Yongmei Chen, Huixiong Dai, Kfir Dotan, Dale Huang, Alison Nalven, Chris Ngai, Gaetano Santoro, Bharath Vijayaraghavan, Peng Xie, Jun Xue
Proceedings Volume 9050, 905030 (2014) https://doi.org/10.1117/12.2048356
KEYWORDS: Inspection, Polarization, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Photomasks, Signal to noise ratio, Wafer inspection, Metrology

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