Ms. Diana Fernandez Rodas Profile

Diana Fernandez Rodas

at CEA-LETI

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Profile Summary

Diana Fernandez Rodas received her engineering and master’s degrees in materials sciences from the Institut National des Sciences Appliquées (INSA) de Lyon in 2021. Currently, she is as a PhD student at CEA-LETI working on high-resolution 3D patterning.

Publications (4)

Proceedings Article | 10 April 2024 Poster

Multi-height pillars replication from a grayscale resist master by nanoimprint process

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle D'Affroux, Chiara Sabbione

Proceedings Volume PC12956, PC1295613 (2024) https://doi.org/10.1117/12.3014929

KEYWORDS: Photoresist processing, Nanoimprint lithography, UV optics, Silicon, Silica, Semiconducting wafers, Microlens, Lithography, Grayscale lithography, Etching

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Proceedings Article | 9 April 2024 Poster + Paper

Manufacturing of 3D submicronic structures at wafer scale

Diana Fernandez Rodas, Jérôme Rêche, Ivanie Mendes, Raluca Tiron

Proceedings Volume 12956, 129560L (2024) https://doi.org/10.1117/12.3009978

KEYWORDS: Nanoimprint lithography, Manufacturing, Atomic force microscopy, Electron beam lithography, Deformation, Shrinkage, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Standards development, Grayscale lithography

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Proceedings Article | 3 October 2023 Presentation + Paper

3D resist master evaluation protocol for nanoimprint lithography

Diana Fernandez Rodas, Jérôme Rêche, Raluca Tiron

Proceedings Volume 12653, 126530F (2023) https://doi.org/10.1117/12.2676111

KEYWORDS: Advanced patterning, Electron beam lithography, Grayscale lithography, Material characterization, Manufacturing, Nanoimprint lithography, Scanning electron microscopy, Adhesion, Ultraviolet radiation, Deformation, Silicon, Interfaces, Atomic force microscopy, Shrinkage

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Proceedings Article | 1 May 2023 Presentation + Paper

Replication of 3D patterns from a grayscale resist master by nanoimprint process

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle d'Affroux, Sébastien Berard Bergery

Proceedings Volume 12497, 124970A (2023) https://doi.org/10.1117/12.2658384

KEYWORDS: Microlens, Nanoimprint lithography, Photoresist processing, Atomic force microscopy, Scanning electron microscopy, Manufacturing, Critical dimension metrology, Silicon, Printing, Etching

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