Dr. Florian Delachat Profile

Dr. Florian Delachat

at CEA-LETI

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 March 2019 Paper

Evaluation of adhesion layers performances for soft UV nanoimprint lithography

F. Delachat, H. Teyssedre, L. Pain, X. Chevalier, Célia Nicolet, Christophe Navarro

Proceedings Volume 10958, 1095816 (2019) https://doi.org/10.1117/12.2515607

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Adhesives, Ultraviolet radiation, Silicon, Thin films, Etching, Coating

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Proceedings Article | 19 September 2018 Paper

Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models

H. Teyssedre, P. Quemere, J. Chartoire, F. Delachat, F. Boudaa, L. Perraud, M. May

Proceedings Volume 10775, 107750A (2018) https://doi.org/10.1117/12.2326106

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Nanoimprint lithography, Calibration, Manufacturing, Silicon, Lithography, Coating, Data modeling, Scanning electron microscopy

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Proceedings Article | 20 March 2018 Presentation + Paper

Dependencies of bias tables to pattern density, critical dimension, global coordinates and pattern orientation for nanoimprint master manufacturing for the 200 mm wafer scale SmartNIL process

P. Quemere, J. Chartoire, F. Delachat, F. Boudaa, L. Perraud, M. May, H. Teyssedre

Proceedings Volume 10588, 1058807 (2018) https://doi.org/10.1117/12.2299326

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Nanoimprint lithography, Manufacturing, Metrology, Photoresist processing, Silicon, Data modeling, Coating, Scanning electron microscopy

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Proceedings Article | 19 March 2018 Presentation

Characterizing the internal structure of BCP filled contact holes with critical dimension small angle x-ray scattering (Conference Presentation)

Daniel Sunday, Florian Delachat, Ahmed Gharbi, Guillaume Freychet, Raluca Tiron, R. Joseph Kline

Proceedings Volume 10586, 105860X (2018) https://doi.org/10.1117/12.2297480

KEYWORDS: Scattering, X-rays, Directed self assembly, Integrated circuits, Optical lithography, Etching, 3D acquisition, 3D modeling

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Proceedings Article | 19 March 2018 Presentation

Inorganic guiding template implementation for DSA contact hole shrink process (Conference Presentation)

Ahmed Gharbi, Florian DELACHAT, Patricia Pimenta-Barros, Gaëlle Chamiot-Maitral, Maxime Argoud, Celine Lapeyre, Laurent Pain, Christophe Navarro, Célia Nicolet, Ian Cayrefourcq, Raluca Tiron

Proceedings Volume 10584, 105840D (2018) https://doi.org/10.1117/12.2297422

KEYWORDS: Directed self assembly, Optical lithography, Critical dimension metrology, Silicon, Oxides, Semiconducting wafers, Semiconductors, Materials processing, Photomasks, Photoresist processing

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Proceedings Article | 13 March 2018 Paper

Evaluation of anti-sticking layers performances for 200mm wafer scale Smart NILTM process through surface and defectivity characterizations

F. Delachat, J.-C. Phillipe, V. Larrey, F. Fournel, S. Bos, H. Teyssèdre , Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq

Proceedings Volume 10586, 1058615 (2018) https://doi.org/10.1117/12.2298407

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Silicon, Manufacturing, Scanning electron microscopy, Inspection, Particles, Etching, Photomasks, Ultraviolet radiation

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Proceedings Article | 10 April 2017 Presentation + Paper

Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain

Proceedings Volume 10149, 101490K (2017) https://doi.org/10.1117/12.2259966

KEYWORDS: Directed self assembly, Lithography, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Etching, Electron beam lithography, System on a chip, Critical dimension metrology, Photoresist processing

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Proceedings Article | 21 March 2017 Paper

Advanced surface affinity control for DSA contact hole shrink applications

Florian Delachat, Ahmed Gharbi, Patricia Pimenta Barros, Maxime Argoud, Céline Lapeyre, Sandra Bos, Jérôme Hazart, Laurent Pain, Cédric Monget, Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Raluca Tiron

Proceedings Volume 10144, 101440O (2017) https://doi.org/10.1117/12.2258043

KEYWORDS: Directed self assembly, Lithography, Immersion lithography, Polymers, Semiconducting wafers, Polymethylmethacrylate, Scanning electron microscopy, Inspection, Image processing, Picosecond phenomena

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SPIE Journal Paper | 18 October 2016

Process highlights to enhance directed self-assembly contact patterning performances

Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Gaëlle Chamiot-Maitral, Antoine Fouquet, Céline Lapeyre, Patricia Pimenta-Barros, Florian Delachat, Sandra Bos, Shayma Bouanani, Xavier Chevalier, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Laurent Pain

JM3, Vol. 15, Issue 04, 043503, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043503

KEYWORDS: Directed self assembly, Optical lithography, Annealing, Picosecond phenomena, Critical dimension metrology, Scanning electron microscopy, Materials processing, Semiconducting wafers, Lithography, Molecular self-assembly

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Proceedings Article | 22 March 2016 Paper

Process highlights to enhance DSA contact patterning performances

A. Gharbi, R. Tiron, M. Argoud, G. Chamiot-Maitral, A. Fouquet, C. Lapeyre, P. Pimenta Barros, A. Sarrazin, I. Servin, F. Delachat, S. Bos, S. Bérard-Bergery, J. Hazart, X. Chevalier, C. Nicolet, C. Navarro, I. Cayrefourcq, S. Bouanani, C. Monget

Proceedings Volume 9777, 97770T (2016) https://doi.org/10.1117/12.2219210

KEYWORDS: Directed self assembly, Optical lithography, Inspection, Lithography, Etching, Semiconducting wafers, Scanning electron microscopy, Defect detection, Critical dimension metrology, Materials processing, Photomasks, Picosecond phenomena, Annealing, Molecular self-assembly, Image processing

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Proceedings Article | 31 October 2012 Paper

Formation of silicon nanoparticles from high temperature annealed silicon rich silicon oxynitride films

Abdelilah Slaoui, Fabien Ehrhardt, Florian Delachat, Gérald Ferblantier, Dominique Muller

Proceedings Volume 8471, 84710B (2012) https://doi.org/10.1117/12.929261

KEYWORDS: Silicon, Nanoparticles, Crystals, Raman spectroscopy, Annealing, Luminescence, Silicon films, Chemical species, Dielectrics, Transmission electron microscopy

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Showing 5 of 11 publications

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