Dr. Hans W.P. Koops Profile

Dr. Hans W.P. Koops

CEO at HaWilKo GmbH

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 28 June 2005 Paper

Proposal of a miniaturized Orbitron pump for MEMS applications

Hans Koops

Proceedings Volume 5838, (2005) https://doi.org/10.1117/12.627564

KEYWORDS: Ions, Titanium, Particles, Microelectromechanical systems, Ionization, Metals, Electron beams, Thin film coatings, Free electron lasers, Resistance

Read Abstract +

Proceedings Article | 17 December 2003 Paper

A novel electron-beam-based photomask repair tool

Klaus Edinger, Hans Becht, Rainer Becker, Volker Bert, Volker Boegli, Michael Budach, Susanne Göhde, Jochen Guyot, Thorsten Hofmann, Ottmar Hoinkis, Alexander Kaya, Hans Koops, Petra Spies, Bernd Weyrauch, Johannes Bihr

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.532866

KEYWORDS: Photomasks, Etching, Electron beams, Quartz, Silicon carbide, Scanning electron microscopy, Image processing, Chromium, Ion beams, Molecules

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Application of electron-beam induced processes to mask repair

Klaus Edinger, Volker Boegli, Michael Budach, Ottmar Hoinkis, Bernd Weyrauch, Hans Koops, Johannes Bihr, Jens Greiser

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504061

KEYWORDS: Photomasks, Etching, Electron beams, Ion beams, Lithography, Silicon carbide, Gemini Observatory, Magnetism, Signal attenuation, Electron beam lithography

Read Abstract +

Proceedings Article | 28 May 2003 Paper

Electron-beam mask repair with induced reactions

Hans Koops, Klaus Edinger, Johannes Bihr, Volker Boegli, Jens Greiser

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514972

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Interferometers, Charged-particle lithography, Quartz, Silicon carbide, Scanning electron microscopy, Control systems

Read Abstract +

Proceedings Article | 24 April 2003 Paper

Rapid prototyping and structure generation using three-dimensional nanolithography with electron-beam-induced chemical reactions

Hans Koops

Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.500603

KEYWORDS: Nanolithography, Electron beams, Etching, Photonic crystals, Rapid manufacturing, Metals, Ions, Computing systems, Control systems, Molecules

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Electron-beam-induced processes and their applicability to mask repair

Volker Boegli, Hans Koops, Michael Budach, Klaus Edinger, Ottmar Hoinkis, Bernd Weyrauch, Rainer Becker, Rudolf Schmidt, Alexander Kaya, Andreas Reinhardt, Stephan Braeuer, Heinz Honold, Johannes Bihr, Jens Greiser, Michael Eisenmann

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468200

KEYWORDS: Photomasks, Electron beams, Etching, Platinum, Ultraviolet radiation, Extreme ultraviolet, Quartz, Scanning electron microscopy, Interferometers, Chemical reactions

Read Abstract +

Proceedings Article | 9 April 2001 Paper

Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies

Hans Koops

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425093

KEYWORDS: Photomasks, Ions, Scattering, Ion beams, Quartz, Lithography, Etching, Silicon, Silicon carbide, Laser scattering

Read Abstract +

Proceedings Article | 22 September 1997 Paper

Proposal for polymer photonic bandgap materials fabricated by dry etching and diffusion

Hans Koops

Proceedings Volume 3135, (1997) https://doi.org/10.1117/12.284107

KEYWORDS: Polymers, Diffusion, Etching, Photomasks, Integrated optics, Chemical elements, Optical components, Dry etching, Optoelectronics, Photorefractive polymers

Read Abstract +

Proceedings Article | 1 November 1996 Paper

Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Sergey Babin, Mark Weber, Hans Koops

Proceedings Volume 2863, (1996) https://doi.org/10.1117/12.256212

KEYWORDS: Microlens, Single mode fibers, Quartz, Lithography, Photoresist processing, Scanning electron microscopy, Silicon, Electron microscopes, Image processing, 3D image processing

Read Abstract +

Proceedings Article | 25 October 1996 Paper

Photonic crystals built by three-dimensional additive lithography enable integrated optics of high density

Hans Koops

Proceedings Volume 2849, (1996) https://doi.org/10.1117/12.255483

KEYWORDS: Photonic crystals, Crystals, Lithography, Dielectrics, Integrated optics, Switches, Nanolithography, Mirrors, Tunable filters, Waveguides

Read Abstract +

Photonic crystals were investigated experimentally in a scaled setup with microwaves in the form of 2D arrays of dielectric rods of high permittivity surrounded by air and are reported in the literature. These crystals render perfect mirrors for a band of wavelengths. Having an impurity built into the structure, transmission filters with a specific narrow bandwidth can be generated. The predominant feature of these structures is, that devices of high finesses are obtained with as few as 6 planes of dielectric rods. The grid constant of the rods is < (lambda) /3, with (lambda) the wavelength used in the device. The rod diameter is < (lambda) /6 and the length of the rods should exceed 2 (lambda) . Therefore photonic crystal elements extend only a few micrometers in the x-, y-, and z- dimension. In combination with monomode-waveguides and applying some areas filled with non-linear optical materials, tunable filters and switches for the routing of light can be built in a very compact way. It is the first time, that 3D additive lithography with electron-beam induced deposition is employed to generate photonic crystals. This technique allows to generate insulating or conductive structures from wires with > 80 nm diameter and micrometers dimensions with a surface roughness below 3 nm. It offers the freedom to taylor the refractive index of the material by selecting precursor materials, deposition conditions, and exposure mode. A scanning electron microscope with VIDAS-beam control system is used for this lithography. A custom designed lithography function allows to control position, dwelltime, and sequence of the pixels. Using a program generated database, which contains all pixel and time information required, 3D structures are generated with the deposition process. The devices are placed with nm precision in waveguide patterns. Macro-controlled construction of arrays of dielectric rods of high aspect ratios is presented, which resemble perfect or imperfect photonic crystals. Using specialized crystals, filters and tunable filters dense devices for routing of light or optical metrology can be fabricated.

Proceedings Article | 14 June 1996 Paper

Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

Hans Koops, Sergey Babin, Mark Weber, G. Dahm, A. Holopkin, M. Lyakhov

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241856

KEYWORDS: Lithography, Photoresist processing, Microlens, Silicon, Electrons, Etching, Plasma etching, Polymers, Single mode fibers, Plasma

Read Abstract +

Proceedings Article | 1 May 1996 Paper

High-Q photonic band gap resonant cavities: from mm-wave to optical regime

Shawn-Yu Lin, Vincent Hietala, S. Lyo, Hans Koops, Pierre Villeneuve, John Joannopoulos

Proceedings Volume 2693, (1996) https://doi.org/10.1117/12.238952

KEYWORDS: Quantum wells, Photonic crystals, Nanofabrication, Quantum dots, Signal detection, Scanning electron microscopy, Near infrared, Visible radiation, Light wave propagation, Radio propagation

Read Abstract +

Proceedings Article | 8 April 1996 Paper

Three-dimensional additive electron beam lithography

Hans Koops, Mark Weber, C. Schossler, A. Kaja

Proceedings Volume 2780, (1996) https://doi.org/10.1117/12.238195

Read Abstract +

Proceedings Article | 25 September 1995 Paper

Comparative study of supertips for electron field emitters

Hans Koops, Mark Weber, J. Urban, C. Schoessler

Proceedings Volume 2522, (1995) https://doi.org/10.1117/12.221573

KEYWORDS: Crystals, Lithography, Electron beams, Scanning tunneling microscopy, Scanning electron microscopy, Nanocrystals, Charged particle optics, Electron beam lithography, Electron microscopes, Tungsten

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years