Dr. Henri Fledderus Profile

Dr. Henri Fledderus

at Holst Ctr

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Author

Publications (9)

Proceedings Article | 14 March 2018 Presentation

R2R suitable processing of large area organic electronics with integrated barrier layer using short-pulsed lasers

Udo Klotzbach, Henri Fledderus, Niels Friedrich-Schilling, Thomas Kuntze

Proceedings Volume 10520, 105200U (2018) https://doi.org/10.1117/12.2319072

Proceedings Article | 25 August 2017 Paper

Up-scaling perovskite solar cell manufacturing from sheet-to-sheet to roll-to-roll: challenges and solutions

Francesco Di Giacomo, Yulia Galagan, Santhosh Shanmugam, Harrie Gorter, Fieke van den Bruele, Gerwin Kirchner, Ike de Vries, Henri Fledderus, Herbert Lifka, Sjoerd Veenstra, Tom Aernouts, Pim Groen, Ronn Andrissen

Proceedings Volume 10363, 103630E (2017) https://doi.org/10.1117/12.2274438

KEYWORDS: Coating, Solar cells, Crystals, Fabrication, Thin film solar cells, Thin films, Photovoltaics, Sputter deposition, Atomic layer deposition

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Proceedings Article | 7 March 2017 Presentation + Paper

Roll-to-roll suitable short-pulsed laser scribing of organic photovoltaics and close-to-process characterization

Thomas Kuntze, Philipp Wollmann, Udo Klotzbach, Henri Fledderus

Proceedings Volume 10092, 100920J (2017) https://doi.org/10.1117/12.2255934

KEYWORDS: Organic photovoltaics, Pulsed laser operation, Picosecond phenomena, Laser systems engineering, Electrodes, Laser processing, Calcium, Laser ablation, Hyperspectral imaging, Solar cells

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Proceedings Article | 17 February 2017 Paper

Patterning of organic photovoltaic on R2R processed thin film barriers using IR laser sources

H. Fledderus, H. Akkerman, A. Salem, N. Friedrich Schilling, U. Klotzbach

Proceedings Volume 10092, 100920I (2017) https://doi.org/10.1117/12.2248533

KEYWORDS: Laser development, Thin films, Calcium, Laser ablation, Pulsed laser operation, Picosecond phenomena, Laser systems engineering, Femtosecond phenomena, Laser induced damage, Optical lithography

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Proceedings Article | 4 May 2012 Paper

Influence of barrier absorption properties on laser patterning thin organic films

Sanjeev Naithani, Rajesh Mandamparambil, Ferdie van Assche, David Schaubroeck, Henri Fledderus, An Prenen, Geert Van Steenberge, Jan Vanfleteren

Proceedings Volume 8435, 843505 (2012) https://doi.org/10.1117/12.922709

KEYWORDS: Absorption, Thin films, Laser ablation, Optical lithography, Polymers, Excimer lasers, Organic light emitting diodes, Glasses, Laser processing, Polymer thin films

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Proceedings Article | 23 April 2001 Paper

Soft x-ray emission from a double-stream gas puff target irradiated by a nanosecond laser pulse

Andrzej Bartnik, Henryk Fiedorowicz, Rafal Rakowski, Miroslaw Szczurek, Fred Bijkerk, R. Bruijn, H. Fledderus

Proceedings Volume 4424, (2001) https://doi.org/10.1117/12.425644

KEYWORDS: Plasma, X-rays, Xenon, Argon, Helium, Pulsed laser operation, Photodiodes, Mirrors, Optical filters, Coded apertures

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Proceedings Article | 8 November 2000 Paper

Portable diagnostics for EUV light sources

R. Stuik, Raluca Constantinescu, Petra Hegeman, Jeroen Jonkers, H. Fledderus, Vadim Banine, Fred Bijkerk

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406663

KEYWORDS: Extreme ultraviolet, Diagnostics, Plasma, Spectroscopy, Coded apertures, Mirrors, Light sources, Contamination, Calibration, CCD cameras

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Proceedings Article | 21 July 2000 Paper

Characterization of a novel double-gas-jet laser plasma EUV source

Rene de Bruijn, Andrzej Bartnik, H. Fledderus, Henryk Fiedorowicz, Petra Hegeman, Raluca Constantinescu, Fred Bijkerk

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390050

KEYWORDS: Extreme ultraviolet, Plasma, Xenon, Pulsed laser operation, Hydrogen, Diodes, Optical filters, Absorption, Mirrors, Argon

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Proceedings Article | 5 June 1998 Paper

Demonstration of a foil trap technique to eliminate laser plasma atomic debris and small particulates

L. Shmaenok, C. de Bruijn, H. Fledderus, R. Stuik, Alexander Schmidt, Dmitrii Simanovski, Anatoley Sorokin, T. Andreeva, Fred Bijkerk

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309633

KEYWORDS: Chemical species, Plasma, Extreme ultraviolet, Particles, Temperature metrology, Laser scattering, Scattering, Extreme ultraviolet lithography, Krypton, Optical filters

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Showing 5 of 9 publications

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