Dr. Hiroshi Takenaka
Senior Researcher at Panasonic Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534875
KEYWORDS: Metals, Resistance, Overlay metrology, Lithography, Photomasks, Distortion, Copper, Photography, Electron beam lithography, Optical lithography

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534892
KEYWORDS: Distortion, Reticles, Semiconducting wafers, Photomasks, Optical alignment, Overlay metrology, Electron beam lithography, Projection lithography, Lithography, Data corrections

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534868
KEYWORDS: Photomasks, Electron beam lithography, Projection lithography, Lithography, Finite element methods, Semiconducting wafers, Critical dimension metrology, Optical lithography, Semiconductors, Optical simulations

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484980
KEYWORDS: Distortion, Photomasks, Finite element methods, Lithography, Silicon, Electron beam lithography, Projection lithography, Semiconductors, Semiconducting wafers, Chemical elements

Proceedings Article | 1 July 2002 Paper
Yoichi Tomo, Yoshinori Kojima, Sumito Shimizu, Manabu Watanabe, Hiroshi Takenaka, Hiroshi Yamashita, Teruo Iwasaki, Kimitoshi Takahashi, Masaki Yamabe
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472351
KEYWORDS: Reticles, Photomasks, Diamond, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Projection lithography, Defect detection

Showing 5 of 7 publications
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