Mr. Jiro Yamamoto Profile

Jiro Yamamoto

at Hitachi Ltd

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 20 April 2011 Paper

Novel CD-SEM magnification calibration reference of sub-50-nm pitch multi-layer grating with positional identification mark

Hiroki Kawada, Shozo Yoneda, Jiro Yamamoto, Yoshinori Nakayama, Osamu Inoue

Proceedings Volume 7971, 797129 (2011) https://doi.org/10.1117/12.879347

KEYWORDS: Calibration, Diffraction gratings, Silicon, Surface finishing, Polishing, Multilayers, Lithography, Silica, Inspection, Diffraction

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SPIE Journal Paper | 1 January 2011

Critical dimension-scanning electron microscope magnification calibration with 25-nm pitch grating reference

Yoshinori Nakayama, Jiro Yamamoto, Hiroki Kawada

JM3, Vol. 10, Issue 1, 013021, (January 2011) https://doi.org/10.1117/12.10.1117/1.3565466

KEYWORDS: Calibration, Silicon, Multilayers, Scanning electron microscopy, Diffraction gratings, Electron microscopes, Wet etching, Polishing, Surface finishing, Thin films

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Proceedings Article | 2 April 2010 Paper

Evaluation of 25-nm pitch SiO[sub]2[/sub]/Si multilayer grating reference using CD-SEM

Yoshinori Nakayama, Hiroki Kawada, Jiro Yamamoto

Proceedings Volume 7638, 76382R (2010) https://doi.org/10.1117/12.848308

KEYWORDS: Calibration, Silicon, Diffraction gratings, Multilayers, Silica, Polishing, Scanning electron microscopy, Wet etching, Surface finishing, Line edge roughness

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Proceedings Article | 24 March 2009 Paper

Sub-50-nm pitch size grating reference for CD-SEM magnification calibration

Yoshinori Nakayama, Hiroki Kawada, Jiro Yamamoto

Proceedings Volume 7272, 727224 (2009) https://doi.org/10.1117/12.814048

KEYWORDS: Calibration, Silicon, Scanning electron microscopy, Wet etching, Silica, Diffraction gratings, Line edge roughness, Analytical research, Diffraction, Silicon films

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Proceedings Article | 24 March 2008 Paper

Influence of image processing on line-edge roughness in CD-SEM measurement

Atsuko Yamaguchi, Jiro Yamamoto

Proceedings Volume 6922, 692221 (2008) https://doi.org/10.1117/12.775664

KEYWORDS: Line edge roughness, Smoothing, Scanning electron microscopy, Samarium, Image processing, Image analysis, Signal processing, Line width roughness, Electron microscopes, Interference (communication)

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Proceedings Article | 5 April 2007 Paper

Characterization of line-edge roughness in Cu/low-k interconnect pattern

Daisuke Ryuzaki, Takashi Iizumi, Jiro Yamamoto, Atsuko Yamaguchi, Hiroki Kawada

Proceedings Volume 6518, 65181P (2007) https://doi.org/10.1117/12.710401

KEYWORDS: Line edge roughness, Line width roughness, Copper, Semiconducting wafers, Dielectrics, Diffusion, Metals, Scanning electron microscopy, Reliability, Analytical research

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Proceedings Article | 6 May 2005 Paper

Preliminary study on systematic optimization of EPL mask infrastructure

Jiro Yamamoto, Hiroshi Arimoto, Nobuyuki Iriki

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599533

KEYWORDS: Photomasks, Inspection, Photomicroscopy, Defect inspection, Etching, Semiconducting wafers, Carbon, Image transmission, Printing, Calibration

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Proceedings Article | 6 May 2005 Paper

EPL performance in 65-nm node metallization technology and beyond

K. Koike, H. Sakaue, H. Okamura, J. Yamamoto, H. Kobayashi, K. Takeda, H. Arimoto, F. Shoji, E. Soda, Y. Matsubara, S. Kageyama, T. Nasuno, N. Iriki, F. Koba, T. Tsuchida, H. Yamashita

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599257

KEYWORDS: Metals, Transmission electron microscopy, Lithography, Scanners, Copper, Scanning electron microscopy, Resistance, Electron beam lithography, Overlay metrology, Chemical mechanical planarization

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Proceedings Article | 6 December 2004 Paper

Development of defect inspection and repair systems for EPL mask infrastructure

Hiroshi Arimoto, Nobuyuki Iriki, Jiro Yamamoto

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578652

KEYWORDS: Photomasks, Defect inspection, Inspection, Semiconducting wafers, Printing, Defect detection, Holons, Electron beam lithography, Projection lithography, Nanotechnology

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Proceedings Article | 20 August 2004 Paper

FIB mask repair technology for electron projection lithography

Makoto Sato, Kouji Iwasaki, Hiroshi Matsumura, Masaki Yamabe, Osamu Takaoka, Anto Yasaka, Tatsuya Adachi, Noboru Matsumoto, Kazuo Aita, Takashi Kaito, Masakatsu Hasuda, Katsumi Suzuki, Hiroyuki Suzuki, Teruo Iwasaki, Yoh Yamamoto, Yutaka Ikku, Ryoji Hagiwara, Jiro Yamamoto

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557731

KEYWORDS: Photomasks, Imaging systems, Opacity, Electron beam lithography, Projection lithography, Etching, Ion beams, Sensors, Image processing, Silicon

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Proceedings Article | 20 August 2004 Paper

Stencil mask defect inspection system and advanced application

Jiro Yamamoto, Nakahiro Harada, Naoyuki Nakamura, Satoru Maruyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557819

KEYWORDS: Photomasks, Inspection, Computer aided design, Imaging systems, Defect detection, Charged-particle lithography, Control systems, Defect inspection, Cameras, Image processing

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Proceedings Article | 16 June 2003 Paper

EPL stencil mask defect inspection system using a transmission electron beam

Kiyoaki Tsuta, Masaki Yamabe, Satoru Maruyama, Teruo Iwasaki, Jiro Yamamoto, Norimichi Anazawa

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484975

KEYWORDS: Photomasks, Inspection, Cameras, Defect detection, Image transmission, Image sensors, Image processing, Sensors, Electron beams, Defect inspection

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Proceedings Article | 16 June 2003 Paper

Defect printability of hole pattern in electron projection lithography

Jiro Yamamoto, Yoichi Tomo, Masaki Yamabe, Teruo Iwasaki, Sumito Shimizu

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484976

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Diamond, Defect inspection, Electron beam lithography, Projection lithography, Inspection, Defect detection

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Proceedings Article | 1 July 2002 Paper

Experimental investigation of the Coulomb effect in electron projection lithography (EPL)

Jiro Yamamoto, Akemi Moniwa, Fumio Murai

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472270

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Lithography, Projection lithography, Distortion, Optical simulations, Chemically amplified resists, Photoresist processing, Optical lithography

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Proceedings Article | 1 July 2002 Paper

Dynamic image placement accuracy of a stencil mask

Hiroshi Takenaka, Teruo Iwasaki, Masaki Yamabe, Yoichi Tomo, Manabu Watanabe, J. Yamamoto, Kimitoshi Takahashi, Hiroshi Yamashita

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472269

KEYWORDS: Photomasks, Silicon, Distortion, Beam splitters, 3D modeling, Overlay metrology, Optical simulations, Finite element methods, Chromatic aberrations, Motion estimation

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Proceedings Article | 8 June 1998 Paper

Nanometer-level metrology with a low-voltage CD SEM

Hideo Todokoro, Makoto Ezumi, Tadashi Otaka, Jiro Yamamoto, Toshiyuki Yoshimura, Tsuneo Terasawa

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308768

KEYWORDS: Edge roughness, Metrology, Scanning electron microscopy, Atomic force microscopy, Calibration, Critical dimension metrology, Photoresist processing, Polymers, Electron microscopes, Lithography

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Proceedings Article | 14 June 1996 Paper

Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol

Sonoko Migitaka, Michiaki Hashimoto, Hiroshi Shiraishi, Kyoko Kojima, Takumi Ueno, Shou-ichi Uchino, Jiro Yamamoto

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241859

KEYWORDS: Lithography, Electron beam lithography, Polymers, Electron beams, Analytical research, Optical lithography, Chromatography, Temperature metrology, Custom fabrication, Fabrication

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Proceedings Article | 14 June 1996 Paper

Contrast-boosted resist using a polarity-change reaction during aqueous base development

Sonoko Migitaka, Michiaki Hashimoto, Takumi Ueno, Shou-ichi Uchino, Jiro Yamamoto, Hiroshi Shiraishi, Fumio Murai, Toshihiko Tanaka

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241842

KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Industrial chemicals, Diffusion, Ultraviolet radiation, Absorption, Photography, Analytical research, Photomasks

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Showing 5 of 18 publications

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