Dr. Holger Seitz Profile

Dr. Holger Seitz

at SCHOTT Lithotec AG

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 15 May 2007 Paper

Dry etch behavior of different TaN absorber layers for EUVL mask making

Florian Letzkus, Günter Hess, Mathias Irmscher, Konrad Knapp, Markus Renno, Eugen Röhrle, Holger Seitz

Proceedings Volume 6607, 66073D (2007) https://doi.org/10.1117/12.729032

KEYWORDS: Etching, Dry etching, Extreme ultraviolet lithography, Reflectivity, Photomasks, Inspection, Scanning electron microscopy, Mask making, Electron beam lithography, Manufacturing

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Proceedings Article | 21 June 2006 Paper

The first full-field EUV masks ready for printing

Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, Holger Seitz

Proceedings Volume 6281, 628105 (2006) https://doi.org/10.1117/12.692629

KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Etching, Tolerancing, Image processing, Coating, Printing, Lithography, Reflectivity

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Proceedings Article | 22 March 2006 Paper

EUVL mask blanks: Recent results on substrates, multilayers and the dry-etch process of TaN-absorbers

Holger Seitz, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Torsten Reichardt, Ronny Walter, Helmut Popp, Günter Hess, Florian Letzkus, Jörg Butschke, Mathias Irmscher

Proceedings Volume 6151, 615109 (2006) https://doi.org/10.1117/12.655540

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Multilayers, Dry etching, Polishing, Manufacturing, Reflectivity, Coating

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Proceedings Article | 8 November 2005 Paper

Determination of mask layer stress by placement metrology

Jörg Butschke, Ute Buttgereit, Eric Cotte, Günter Hess, Mathias Irmscher, Holger Seitz

Proceedings Volume 5992, 59923U (2005) https://doi.org/10.1117/12.631526

KEYWORDS: Photomasks, Tantalum, Metrology, Optical lithography, Chromium, Interferometers, Image registration, Quartz, Finite element methods, Lithography

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Proceedings Article | 4 November 2005 Paper

Antireflection solutions for next generation 193-nm binary and phase-shifting masks

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5992, 59920I (2005) https://doi.org/10.1117/12.632113

KEYWORDS: Reflection, Antireflective coatings, Photomasks, Binary data, Inspection, Phase shifts, Interfaces, Etching, Lithography, Opacity

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Proceedings Article | 5 October 2005 Paper

Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning

Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess

Proceedings Volume 5963, 59630J (2005) https://doi.org/10.1117/12.625210

KEYWORDS: Inspection, Etching, Phase shifts, Photomasks, Tantalum, Dry etching, Lithography, Phase shifting, Reflection, Oxides

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Proceedings Article | 28 June 2005 Paper

EUV mask image placement management in writing, registration, and exposure tools

Eric Cotte, Uwe Dersch, Christian Holfeld, Uwe Mickan, Holger Seitz, Thomas Leutbecher, Gunter Hess

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617484

KEYWORDS: Photomasks, Reticles, Optical lithography, Extreme ultraviolet, Photovoltaics, Extreme ultraviolet lithography, Image registration, Tolerancing, Electron beam lithography, Image quality

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Proceedings Article | 16 June 2005 Paper

High speed reflectometer for EUV mask-blanks

Christian Wies, Rainer Lebert, Bernhard Jagle, L. Juschkin, F. Sobel, H. Seitz, Ronny Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637341

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

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Proceedings Article | 16 June 2005 Paper

Production challenges of making EUV mask blanks

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335

KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

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Proceedings Article | 12 May 2005 Paper

Investigation of polarization effects on new mask materials

Karsten Bubke, Silvio Teuber, Ingo Hoellein, Hans Becker, Holger Seitz, Ute Buttgereit

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599688

KEYWORDS: Photomasks, Polarization, Diffraction, Phase shifts, Tantalum, Binary data, Etching, Lithography, Reticles, Absorbance

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Proceedings Article | 10 May 2005 Paper

High speed reflectometer for EUV mask-blanks

C. Wies, R. Lebert, B. Jaegle, L. Juschkin, F. Sobel, H. Seitz, R. Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599776

KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

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Proceedings Article | 6 May 2005 Paper

Recent results on EUV mask blank multilayers and absorbers

Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

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Proceedings Article | 6 December 2004 Paper

New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM

Hans Becker, Pascal Schley, Frank Schmidt, Frank Sobel, Markus Renno, Nathalie Olschewski, Holger Seitz, Ute Buttgereit, Konrad Knapp, Guenter Hess

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570217

KEYWORDS: Inspection, Etching, Tantalum, Phase shifts, Dry etching, Lithography, Oxides, Silica, Reflection, Mask cleaning

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Proceedings Article | 6 December 2004 Paper

Absorber stack optimization toward EUV lithography mask blank pilot production

Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787

KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

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Proceedings Article | 20 May 2004 Paper

High-throughput EUV reflectometer for EUV mask blanks

Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen, Lutz Aschke, Frank Sobel, Holger Seitz, Frank Scholze, Gerhard Ulm, Konstantin Walter, Willi Neff, Klaus Bergmann, Wolfgang Biel

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537012

KEYWORDS: Reflectometry, Photomasks, Extreme ultraviolet, Mirrors, Spectrographs, Charge-coupled devices, Metrology, Extreme ultraviolet lithography, Photons, Reflectivity

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Proceedings Article | 20 May 2004 Paper

Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber

Frank Sobel, Lutz Aschke, Frauke Rueggeberg, Holger Seitz, Nathalie Olschewski, Torsten Reichhardt, Hans Becker, Markus Renno, Steffen Kirchner, Thomas Leutbecher, Guenter Hess, Konrad Knapp

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.533292

KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet lithography, Polishing, Extreme ultraviolet, Surface finishing, Magnetorheological finishing, Surface roughness, Silica, Optical coatings

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Showing 5 of 16 publications

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