Iraj Emami
at Advanced Micro Devices
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181K (2007) https://doi.org/10.1117/12.714216
KEYWORDS: Metrology, Overlay metrology, Inspection, Semiconducting wafers, Process control, Yield improvement, Critical dimension metrology, Optical proximity correction, Etching, Lithography

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6155, 61550P (2006) https://doi.org/10.1117/12.660088
KEYWORDS: Optical properties, Thin films, Ellipsometry, Data modeling, Oscillators, X-rays, Spectroscopic ellipsometry, Reflectometry, Silicon, Semiconducting wafers

Proceedings Article | 15 July 2003 Paper
Iraj Emami, Michael McIntyre, Michael Retersdorf
Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.513460
KEYWORDS: Semiconducting wafers, Metrology, Control systems, Manufacturing, Defect detection, Lithium, Semiconductors, Process control, Defect inspection, Electroluminescence

Proceedings Volume Editor (4)

SPIE Conference Volume | 10 March 2006

SPIE Conference Volume | 17 May 2005

SPIE Conference Volume | 29 April 2004

Conference Committee Involvement (6)
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
28 August 2007 | San Diego, California, United States
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
2 August 2005 | San Diego, California, United States
Data Analysis and Modeling for Process Control II
3 March 2005 | San Jose, California, United States
Data Analysis and Modeling for Process Control
26 February 2004 | Santa Clara, California, United States
Showing 5 of 6 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top