Mark A. Caldwell
Process Engineer at NXP Semiconductors
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 April 2007 Paper
Mark Caldwell, Tianming Bao, John Hackenberg, Brian McLain, Omar Munoz, Tab Stephens, Victor Vartanian
Proceedings Volume 6518, 65181L (2007) https://doi.org/10.1117/12.708813
KEYWORDS: Atomic force microscopy, Etching, Critical dimension metrology, 3D metrology, Metrology, Copper, Semiconducting wafers, Scanning electron microscopy, Process control, Transmission electron microscopy

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181K (2007) https://doi.org/10.1117/12.714216
KEYWORDS: Metrology, Overlay metrology, Inspection, Semiconducting wafers, Process control, Yield improvement, Critical dimension metrology, Optical proximity correction, Etching, Lithography

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