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Janet Greene
at Cadence Design Systems
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Publications (1)
Proceedings Article | 10 July 2003 Paper
Design-to-process integration: optimizing 130-nm X architecture manufacturing
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485258
KEYWORDS: Optical proximity correction, Photomasks, Reticles, Manufacturing, Inspection, Metals, Semiconducting wafers, Lithography, Silicon, Critical dimension metrology
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