Mr. Shigeru Hirukawa Profile

Shigeru Hirukawa

Assistant Manager at Nikon Corp

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 23 March 2011 Paper

A simple method of source optimization for advanced NAND FLASH process

Yi-Shiang Chang, Satoshi Ogasawara, Koichi Fujii, Shigeru Hirukawa, Motokatsu Imai, Wan-Lin Kuo, Chia-Chi Lin

Proceedings Volume 7973, 79731Z (2011) https://doi.org/10.1117/12.878887

KEYWORDS: Seaborgium, Light sources, Optical lithography, Imaging systems, Excel, Photomasks, Source mask optimization, Lithography, Lithographic illumination, Logic

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Proceedings Article | 2 April 2010 Paper

New exposure tool management technology with quick focus measurement in half pitch 22nm generation

Kazuhiko Fukazawa, Toshiaki Kitamura, Shinsuke Takeda, Yoshihiko Fujimori, Yuji Kudo, Shigeru Hirukawa, Kengo Takemasa, Noriaki Kasai, Yuuichiro Yamazaki, Kiminori Yoshino

Proceedings Volume 7638, 763806 (2010) https://doi.org/10.1117/12.846329

KEYWORDS: Semiconducting wafers, Diffraction, Scanners, Reticles, Calibration, Overlay metrology, Wafer-level optics, Critical dimension metrology, Image analysis

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SPIE Journal Paper | 1 January 2009

Double-patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

JM3, Vol. 8, Issue 01, 011003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023077

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

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Proceedings Article | 7 March 2008 Paper

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Andrew Hazelton, Shinji Wakamoto, Shigeru Hirukawa, Martin McCallum, Nobutaka Magome, Jun Ishikawa, Céline Lapeyre, Isabelle Guilmeau, Sébastien Barnola, Stéphanie Gaugiran

Proceedings Volume 6924, 69240R (2008) https://doi.org/10.1117/12.771914

KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Semiconducting wafers, Lithography, Image processing, Photoresist processing, Optical lithography, Deposition processes

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Proceedings Article | 15 March 2006 Paper

Effects of laser bandwidth on OPE in a modern lithography tool

Kevin Huggins, Toki Tsuyoshi, Meng Ong, Robert Rafac, Christopher Treadway, Devashish Choudhary, Takehito Kudo, Shigeru Hirukawa, Stephen Renwick, Nigel Farrar

Proceedings Volume 6154, 61540Z (2006) https://doi.org/10.1117/12.656816

KEYWORDS: Critical dimension metrology, Scanners, Lithography, Molybdenum, Optical proximity correction, Fiber optic illuminators, Spectroscopy, Light sources, Fluorine, Data modeling

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Proceedings Article | 12 May 2005 Paper

Full-field exposure tools for immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Yuuki Ishii, Kenichi Shiraishi, Shigeru Hirukawa

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599352

KEYWORDS: Resonance energy transfer, Semiconducting wafers, Thin film coatings, Combined lens-mirror systems, Contamination, Phase shifts, Polarization, Projection systems, Critical dimension metrology, Inspection

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Proceedings Article | 12 May 2005 Paper

Development of polarized-light illuminator and its impact

Hisashi Nishinaga, Noriaki Tokuda, Soichi Owa, Shigeru Hirukawa, Osamu Tanitsu, Takehito Kudo, Hirohisa Tanaka

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599356

KEYWORDS: Polarization, Fiber optic illuminators, Lithographic illumination, Resolution enhancement technologies, Wave plates, Lithography, Photomasks, Semiconducting wafers, Line width roughness, Image processing

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Proceedings Article | 10 July 2003 Paper

Design-to-process integration: optimizing 130-nm X architecture manufacturing

Robert Dean, Vinod Malhotra, Nahid King, Michael Sanie, Susan MacDonald, James Jordan, Shigeru Hirukawa

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485258

KEYWORDS: Optical proximity correction, Photomasks, Reticles, Manufacturing, Inspection, Metals, Semiconducting wafers, Lithography, Silicon, Critical dimension metrology

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Proceedings Article | 26 June 2003 Paper

Analysis of imaging performance degradation

Koichi Matsumoto, Tomoyuki Matsuyama, Shigeru Hirukawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485465

KEYWORDS: Birefringence, Wavefront aberrations, Chromatic aberrations, Wavefronts, Surface finishing, Optical lithography, Lithography, Spatial frequencies, Projection systems, Optical components

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Proceedings Article | 26 June 2003 Paper

Aberration optimizing system using Zernike sensitivity method

Yasuo Shimizu, Tadashi Yamaguchi, Kousuke Suzuki, Yuji Shiba, Tomoyuki Matsuyama, Shigeru Hirukawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485459

KEYWORDS: Wavefronts, Imaging systems, Tolerancing, Device simulation, Silicon, Wavefront aberrations, Monochromatic aberrations, Distortion, Scanners, Manufacturing

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Proceedings Article | 26 June 2003 Paper

Simulation benchmarking

Jacek Tyminski, Toshiharu Nakashima, Takehito Kudo, Steve Slonaker, Shigeru Hirukawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485447

KEYWORDS: Picosecond phenomena, Optical lithography, Binary data, Computer simulations, Image acquisition, Cadmium, Electroluminescence, Photomasks, Phase shifts, Solids

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Proceedings Article | 26 June 2003 Paper

Evaluation of Zernike sensitivity method for CD distribution

Toshiharu Nakashima, Steve Slonaker, Takehito Kudo, Shigeru Hirukawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485454

KEYWORDS: Critical dimension metrology, Wavefront aberrations, Picosecond phenomena, Zernike polynomials, Phase shifts, Optical lithography, Cadmium, Image analysis, Scanners, Solids

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Proceedings Article | 30 July 2002 Paper

Impact of Zernike cross-term on linewidth control

Toshiharu Nakashima, Kenji Higashi, Shigeru Hirukawa

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474590

KEYWORDS: LCDs, Lithography, Wavefront aberrations, Lenses, Optical lithography, Distortion, Critical dimension metrology, Phase measurement, Interferometers, Cadmium

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Proceedings Article | 14 September 2001 Paper

Lens aberration control for fine patterning with PSM

Takehito Kudo, Shigeru Hirukawa, Toshiharu Nakashima, Koichi Matsumoto

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435769

KEYWORDS: Wavefront aberrations, Monochromatic aberrations, Optical lithography, Wavefronts, Photomasks, Resolution enhancement technologies, Computer simulations, Lens design, Control systems, Phase shifts

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Proceedings Article | 29 June 1998 Paper

New projection optical system for beyond 150-nm patterning with KrF and ArF sources

Shigeru Hirukawa, Koichi Matsumoto, Kengo Takemasa

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310769

KEYWORDS: Projection systems, Optical lithography, Wafer-level optics, Resolution enhancement technologies, Error control coding, Lithography, Semiconducting wafers, Lithographic illumination, Photomasks, Lithium

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Proceedings Article | 29 June 1998 Paper

Characterization of spatial coherence uniformity in exposure tools

Ilya Grodnensky, Etsuya Morita, Kyoichi Suwa, Shigeru Hirukawa

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310758

KEYWORDS: Coherence (optics), Photoresist materials, Calibration, Scanning electron microscopy, Semiconducting wafers, Spatial coherence, Scanners, Laser scanners, Laser systems engineering, Critical dimension metrology

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Proceedings Article | 26 May 1995 Paper

Automatic laser-scanning focus detection method using printed focus pattern

Kyoichi Suwa, Hiroki Tateno, Nobuyuki Irie, Shigeru Hirukawa

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209298

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Monochromatic aberrations, Reticles, Sensors, Laser vision correction, Optical testing, Time metrology, Silicon

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Proceedings Article | 17 May 1994 Paper

Innovative image formation: coherency controlled imaging

Koichi Matsumoto, Naomasa Shiraishi, Yuichiro Takeuchi, Shigeru Hirukawa

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175475

KEYWORDS: Photomasks, Imaging systems, Coherence imaging, Polarization, Coherence (optics), Projection systems, Image acquisition, Image quality, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 1 June 1992 Paper

New imaging technique for 64M-DRAM

Naomasa Shiraishi, Shigeru Hirukawa, Yuichiro Takeuchi, Nobutaka Magome

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130364

KEYWORDS: Reticles, Semiconducting wafers, Phase shifts, Wafer-level optics, Image resolution, Optical lithography, Aluminum, Computer simulations, Diffraction, Fourier transforms

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Showing 5 of 19 publications

Conference Committee Involvement (1)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

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