Mr. Jun-ichi Kon Profile

Jun-ichi Kon

Researcher of Resist Materials at Fujitsu Labs Ltd

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Author

Publications (7)

Proceedings Article | 26 March 2013 Paper

Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology

Yoshinori Kojima, Yasushi Takahashi, Shuzo Ohshio, Shinji Sugatani, Junichi Kon

Proceedings Volume 8680, 868026 (2013) https://doi.org/10.1117/12.2011628

KEYWORDS: Optical alignment, Electron beam direct write lithography, Optical lithography, Metals, Semiconducting wafers, Process control, Signal detection, Electron beam lithography, Control systems, Silica

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SPIE Journal Paper | 7 August 2012

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon

JM3, Vol. 11, Issue 3, 031403, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031403

KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

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Proceedings Article | 21 March 2012 Paper

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Jun-ichi Kon, Takashi Maruyama, Yoshinori Kojima, Yasushi Takahashi, Shinji Sugatani, Kozo Ogino, Hiromi Hoshino, Hideaki Isobe, Masaki Kurokawa, Akio Yamada

Proceedings Volume 8323, 832324 (2012) https://doi.org/10.1117/12.916305

KEYWORDS: Diffusion, Chemically amplified resists, Lithography, Manufacturing, Optical lithography, Photoresist processing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Beam analyzers

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Proceedings Article | 21 March 2012 Paper

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon

Proceedings Volume 8323, 832326 (2012) https://doi.org/10.1117/12.916338

KEYWORDS: Electron beam direct write lithography, Optical alignment, Electron beams, Control systems, Semiconducting wafers, Overlay metrology, Metals, Photoresist processing, Backscatter, Electron beam lithography

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Proceedings Article | 20 March 2008 Paper

EBDW technology for EB shuttle at 65nm node and beyond

T. Maruyama, M. Takakuwa, Y. Kojima, Y. Takahashi, K. Yamada, J. Kon, M. Miyajima, A. Shimizu, Y. Machida, H. Hoshino, H. Takita, S. Sugatani, H. Tsuchikawa

Proceedings Volume 6921, 69210H (2008) https://doi.org/10.1117/12.772469

KEYWORDS: Photomasks, Critical dimension metrology, Vestigial sideband modulation, Electron beam direct write lithography, Copper, Etching, Manufacturing, Semiconducting wafers, Prototyping, Calibration

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Proceedings Article | 23 June 2000 Paper

High-performance EB chemically amplified resists using alicyclic protective groups

Jun-Ichi Kon, Koji Nozaki, Takahisa Namiki, Ei Yano

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388288

KEYWORDS: Dry etching, Lithography, Chemically amplified resists, Deep ultraviolet, Etching, Photomicroscopy, Plasma, Electron beams, Scanning electron microscopy, Optical lithography

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Proceedings Article | 11 June 1999 Paper

High-performance chemically amplified positive electron-beam resist

Takahisa Namiki, Jun-Ichi Kon, Ei Yano

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350187

KEYWORDS: Polymers, Lithography, Optical lithography, Chemically amplified resists, Photomasks, Silicon, Semiconducting wafers, Scanning electron microscopy, Molecules, Coating

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Showing 5 of 7 publications

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