Mr. Jung Youl Lee Profile

Jung Youl Lee

at Dongjin Semichem Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 4 December 2008 Paper

Influences of various defects on extreme ultra-violet mask

Eun-Jin Kim, Jee-Hye You, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Hye-Keun Oh

Proceedings Volume 7140, 71401N (2008) https://doi.org/10.1117/12.804570

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Refractive index, Carbon, Ruthenium, Ultraviolet radiation, Lithography, Silicon, Molybdenum

Read Abstract +

Proceedings Article | 3 April 2007 Paper

Modified polymer architecture for immersion lithography

Sang Soo Kim, Jeong Woo Kim, Jung Youl Lee, Seung Keun Oh, Sang Hyang Lee, Jung Woo Kim, Jae Woo Lee, Deog bae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seoung-Chan Moon

Proceedings Volume 6519, 65191W (2007) https://doi.org/10.1117/12.711657

KEYWORDS: Polymers, Polymerization, Line width roughness, Immersion lithography, Palladium, Line edge roughness, Photoresist processing, Promethium, Polymer thin films, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 March 2007 Paper

Effect of deprotection activation energy on lithographic performance of EUVL resist

Sang-Jeoung Kim, Geun-Jong Yu, Jung-Yeol Lee, Hyun-Jin Kim, Jae-Woo Lee, Deog-Bae Kim, Yool Kang, Jaehyun Kim

Proceedings Volume 6519, 651947 (2007) https://doi.org/10.1117/12.711951

KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing

Read Abstract +

Proceedings Article | 23 March 2007 Paper

Polymer structure modifications for immersion leaching control

Sang Hyang Lee, Jung Woo Kim, Jeong Woo Kim, Seung Keun Oh, Chan Sik Park, Jung Youl Lee, Sang Soo Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon

Proceedings Volume 6519, 651925 (2007) https://doi.org/10.1117/12.711889

KEYWORDS: Polymers, Semiconducting wafers, Fluorine, Immersion lithography, Semiconductors, Polymer thin films, Photoresist materials, Lithography, Manufacturing, Silicon

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Parameter investigation of PEB sensitivity

Seung Keun Oh, Eun Kyung Son, Chan Sik Park, Jung Youl Lee, Jeong Woo Kim, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon

Proceedings Volume 6153, 615335 (2006) https://doi.org/10.1117/12.655449

KEYWORDS: Polymers, Diffusion, Critical dimension metrology, Molecules, Photoresist processing, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Lithography, Photoresist materials

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years