Prof. Hye-Keun Oh Profile

Prof. Hye-Keun Oh

Professor of Applied Physics at Hanyang Univ

SPIE Involvement:

Author

Publications (131)

Proceedings Article | 20 November 2024 Poster + Paper

Improving process window and resolution through source polarization in High-NA EUV

Yu-Jin Chae, Min-Woo Kim, Da-Kyung Yu, Seung-woo Son, Michael Yeung, Hye-Keun Oh

Proceedings Volume 13216, 132162M (2024) https://doi.org/10.1117/12.3037370

KEYWORDS: Polarization, Light sources and illumination, Nanoimprint lithography, Extreme ultraviolet, Manufacturing, Extreme ultraviolet lithography, Image resolution, Optical lithography, Image quality, Source mask optimization

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Proceedings Article | 20 November 2024 Poster + Paper

Through pitch line width difference minimization by pixel source optimization

Min-Woo Kim, Da-Kyung Yu, Yu-Jin Chae, Hee-Chang Ko, Ji-Won Kang, Michael Yeung, Seung-Woo Son, Hye-Keun Oh

Proceedings Volume 13216, 132162L (2024) https://doi.org/10.1117/12.3037354

KEYWORDS: Optical proximity correction, Critical dimension metrology, Light sources and illumination, Semiconducting wafers, Mathematical optimization, Lithography, Extreme ultraviolet lithography, 3D mask effects, Source mask optimization

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Proceedings Article | 12 November 2024 Poster + Paper

Relative lifetime estimation of EUV pellicle by normalized thermal stress

Ji-Hyun Jeon, Seung-Woo Son, Hye-Keun Oh

Proceedings Volume 13215, 132151C (2024) https://doi.org/10.1117/12.3038648

KEYWORDS: Pellicles, Extreme ultraviolet, Material fatigue, Semiconducting wafers, Simulations, Particles, Materials properties, Extreme ultraviolet lithography, Thermal modeling, Composites, Carbon nanotubes

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Proceedings Article | 12 November 2024 Poster + Paper

Underlayer dependent local wafer deformation during EUV exposure

Hee-Chang Ko, Ji-Won Kang, Ji-Hyun Jeon, Seung-Woo Son, Hye-Keun Oh

Proceedings Volume 13215, 1321518 (2024) https://doi.org/10.1117/12.3029441

KEYWORDS: Thermal deformation, Semiconducting wafers, Extreme ultraviolet lithography, Simulations, Extreme ultraviolet, Photoresist materials, Thin films, Overlay metrology, Scanners, Silicon

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Proceedings Article | 12 November 2024 Poster + Paper

Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns

Da-Kyung Yu, Min-Woo Kim, Gug-Yong Kim, Yu-Jin Chae, Seoung-woo Son, Michael Yeung, Hye-Keun Oh

Proceedings Volume 13215, 132151A (2024) https://doi.org/10.1117/12.3036974

KEYWORDS: Light sources and illumination, Optical proximity correction, Optical lithography, Extreme ultraviolet lithography, Light sources, Manufacturing, Lithography, Mathematical optimization, Source mask optimization

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Proceedings Article | 10 April 2024 Poster + Paper

A novel solution for next-generation EUV pellicle: breathable membrane with increased transmittance

Haneul Kim, Jungyeon Kim, Young-Woo Kang, Min-woo Kim, Tae Joong Ha, Gi Sung Lee, Hye-Keun Oh, Jinho Ahn

Proceedings Volume 12953, 129531B (2024) https://doi.org/10.1117/12.3011123

KEYWORDS: Pellicles, Porosity, Transmittance, Extreme ultraviolet, Simulations, Film thickness, Lithography, Extreme ultraviolet lithography, Finite element methods, Critical dimension metrology

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Proceedings Article | 21 November 2023 Poster + Paper

Comparing the mechanical stability of the pellicle under mask stage acceleration with different defect conditions

Ji-Hyun Jeon, Ji-Won Kang, Hye-Keun Oh

Proceedings Volume 12750, 1275013 (2023) https://doi.org/10.1117/12.2687920

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Particles, Finite element methods, Extreme ultraviolet lithography, Yield improvement, Transmittance, Thermal stability, Thermal deformation

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Proceedings Article | 21 November 2023 Poster + Paper

Thermal deformation variations with field positions on the wafer and resist types (CAR and MOR)

Hee-Chang Ko, Min-Woo Kim, Ji-Won Kang, Hye-Keun Oh

Proceedings Volume 12750, 1275016 (2023) https://doi.org/10.1117/12.2686285

KEYWORDS: Thermal deformation, Semiconducting wafers, Extreme ultraviolet lithography, Materials properties, Scanners, Optical lithography, Finite element methods, Extreme ultraviolet, Convection, Overlay metrology

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Proceedings Article | 28 April 2023 Presentation + Paper

Effect of particle defect to extreme ultra-violet pellicle

Ji-Hyun Jeon, Ji-Won Kang, Hee-Chang Ko, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12494, 124940G (2023) https://doi.org/10.1117/12.2657898

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology, Semiconducting wafers, Tin, Aluminum, Scanners, Materials properties, High volume manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Estimation of mechanical stability of EUV pellicle by the collision of the particle defect

Ji-Won Kang, Won-Young Choi, Hee-Chang Ko, Jang-Gun Park, Min-Woo Kim, Jun-Hyeung Lee, Hye-Keun Oh

Proceedings Volume 12292, 122920S (2022) https://doi.org/10.1117/12.2643119

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Graphene, Silicon carbide, Transmittance, Extreme ultraviolet lithography, Photomasks, Image processing, Semiconducting wafers

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Proceedings Article | 31 October 2022 Poster

Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, Hyekeun Oh

Proceedings Volume PC12292, PC122920R (2022) https://doi.org/10.1117/12.2643047

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Absorption, Thin films, Semiconducting wafers, Photoresist materials, Overlay metrology, Thin film manufacturing, Thin film deposition, Semiconductors

Proceedings Article | 26 May 2022 Poster + Paper

Optimal thickness of phase shift mask considering phase and reflectance in high NA EUV contact-hole pattern

Jang-Gun Park, Min-Woo Kim, Ji-Won Kang, Hee-Chang Ko, Jun-Hyung Lee, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12051, 120510O (2022) https://doi.org/10.1117/12.2613984

KEYWORDS: Reflectivity, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Phase shifts, Stochastic processes, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, 3D image processing

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Proceedings Article | 12 October 2021 Presentation + Paper

Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

In-Hwa Kang, Jang-Gun Park, Min-Woo Kim, Jun-Hyeong Lee, Hye-Keun Oh

Proceedings Volume 11855, 118550P (2021) https://doi.org/10.1117/12.2602035

KEYWORDS: Reflectivity, Photomasks, Phase shifts, Diffraction, Extreme ultraviolet, Image processing, Optical lithography, Image quality, Extreme ultraviolet lithography, Absorption

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SPIE Journal Paper | 31 August 2021

Possible extreme ultraviolet mask thermal deformation during exposure

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 031012, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031012

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Convection, Tantalum, Nickel, Absorption, Multilayers, Silicon

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SPIE Journal Paper | 2 August 2021

Reduced lifetime of EUV pellicles due to defects

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 034401, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Transmittance, Absorption, Reflectivity, Semiconducting wafers, Silicon carbide, Tin

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Proceedings Article | 22 February 2021 Poster + Paper

Line width roughness variation and printing failures caused by stochastic effect at extreme-ultraviolet exposure

In-Hwa Kang, Tae-Yi Kim, Su-Mi Hur, Chung-Hyun Ban, Jang-Gun Park, Hye-Keun Oh

Proceedings Volume 11609, 116091K (2021) https://doi.org/10.1117/12.2583690

KEYWORDS: Line width roughness, Extreme ultraviolet, Stochastic processes, Polymers, Extreme ultraviolet lithography, Chemical reactions, Quenching (fluorescence), Photoresist materials, Manufacturing, Ionization

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Proceedings Article | 22 February 2021 Poster + Presentation

Wafer heating analysis with pattern variation in EUVL

Won-Young Choi, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 11609, 116091P (2021) https://doi.org/10.1117/12.2583917

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Proceedings Article | 22 February 2021 Poster + Presentation

Effect of contaminants on pellicle lifetime for EUV lithography

Chung-Hyun Ban, In-Hwa Kang, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 11609, 116091J (2021) https://doi.org/10.1117/12.2583675

KEYWORDS: Pellicles, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Finite element methods, Absorption, Thermography, Thermal modeling, Silicon carbide, Silica

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Proceedings Article | 20 September 2020 Poster

Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, Hye-Keun Oh

Proceedings Volume 11517, 115171C (2020) https://doi.org/10.1117/12.2573149

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Light sources, Finite element methods, Reflectivity, Thermal effects, Pellicles, Semiconducting wafers, Computer simulations

Proceedings Article | 26 September 2019 Presentation + Paper

Extreme-ultraviolet pellicle durability comparison for better lifetime

Hyo-Gyeong Shin, Hye-Keun Oh

Proceedings Volume 11147, 111470U (2019) https://doi.org/10.1117/12.2536992

KEYWORDS: Pellicles, Extreme ultraviolet, Ruthenium, Particles, Extreme ultraviolet lithography, Lithography, Optical lithography, High volume manufacturing, Silicon carbide, Graphene

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Proceedings Article | 26 September 2019 Paper

Pattern dependent distortion and temperature variation in EUV mask

Chung-Hyun Ban, Eun-Sang Park, Ui-Jeong Ha, Chae-Yun Lim, Hye-Keun Oh

Proceedings Volume 11147, 111471R (2019) https://doi.org/10.1117/12.2536721

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Semiconductors, Cooling systems, High volume manufacturing, Pellicles, Mirrors, Overlay metrology

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Proceedings Article | 7 November 2018 Presentation

Extreme ultraviolet pellicle cooling by hydrogen gas flow (Conference Presentation)

Hye-Lim Lee, Sung-Gyu Lee, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10809, 108091B (2018) https://doi.org/10.1117/12.2502731

KEYWORDS: Pellicles, Extreme ultraviolet, Hydrogen, Extreme ultraviolet lithography, Finite element methods

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Proceedings Article | 11 October 2018 Paper

A possible wafer heating during EUV exposure

Se-Hun Oh, Sung-Gyu Lee, Jae-Hun Park, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 10809, 108091R (2018) https://doi.org/10.1117/12.2502918

KEYWORDS: Extreme ultraviolet, Infrared radiation, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Lithography, Optical lithography, EUV optics, Reflectivity, Wafer-level optics

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Proceedings Article | 9 October 2018 Presentation + Paper

Pattern degradation with larger particles on EUV pellicle

Hee-Ra No, Sung-Gyu Lee, Se-Hun Oh, Hye-Keun Oh

Proceedings Volume 10809, 108091G (2018) https://doi.org/10.1117/12.2502784

KEYWORDS: Particles, Extreme ultraviolet, Pellicles, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Photomasks, Contamination, Applied physics, Lithography

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Proceedings Article | 22 March 2018 Paper

Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, 1058322 (2018) https://doi.org/10.1117/12.2299495

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

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SPIE Journal Paper | 29 December 2017

Thermo-optical optimization of extreme-ultraviolet pellicles for future generations

Eun-Sang Park, Chung-hyun Ban, Jae-Hun Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041014, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041014

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers

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Proceedings Article | 26 October 2017 Paper

Wrinkle formation analysis in extreme-ultraviolet pellicle

Hae-Nam Jeong, Guk-Jin Kim, Sung-Gyu Lee, Hye-Keun Oh

Proceedings Volume 10450, 104501Q (2017) https://doi.org/10.1117/12.2281036

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide, Finite element methods, Graphene

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Proceedings Article | 16 October 2017 Paper

Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Sung-Gyu Lee, Guk-Jin Kim, Su-Mi Hur, Hye-Keun Oh

Proceedings Volume 10450, 104501M (2017) https://doi.org/10.1117/12.2280618

KEYWORDS: Extreme ultraviolet, Pellicles, Inspection, Deep ultraviolet, Photomasks, Silicon, Refractive index, Ruthenium, Extreme ultraviolet lithography, Polarization

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Proceedings Article | 16 October 2017 Paper

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

Eun-Sang Park, Chung-Hyun Ban, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10450, 104501K (2017) https://doi.org/10.1117/12.2280518

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Extreme ultraviolet lithography, Silicon, Finite element methods, Graphene, Manufacturing, Ruthenium, Absorption

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Proceedings Article | 16 October 2017 Paper

Lifetime impact on residual stress of EUV pellicle

Min-Woo Kim, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501O (2017) https://doi.org/10.1117/12.2280692

KEYWORDS: Pellicles, Silicon carbide, Silicon, Ruthenium, Extreme ultraviolet, Finite element methods, Extreme ultraviolet lithography, Manufacturing, Silica, Photomasks

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Proceedings Article | 16 October 2017 Paper

Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow

Myung-Gi Kang, Sung-Gyu Lee, Eun-Sang Park, Hye-Keun Oh

Proceedings Volume 10450, 104501N (2017) https://doi.org/10.1117/12.2280691

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Cooling systems, Finite element methods, Silicon, Hydrogen, Photomasks, Radiation effects

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SPIE Journal Paper | 12 October 2017

Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle

Guk-Jin Kim, In-Seon Kim, Sung-Gyu Lee, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041008, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041008

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

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Proceedings Article | 24 March 2017 Paper

Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 10143, 101431P (2017) https://doi.org/10.1117/12.2258188

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical lithography, Optical proximity correction, EUV optics, Photomasks, Wafer-level optics, Reflectivity, Semiconducting wafers, Extreme ultraviolet

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Proceedings Article | 24 March 2017 Paper

CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Jeong-Gu Hwang, In-Seon Kim, Guk-Jin Kim, Hee-Ra No, Byung-Hun Kim, Hye-Keun Oh

Proceedings Volume 10143, 101431U (2017) https://doi.org/10.1117/12.2261827

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Distortion, Extreme ultraviolet, Tolerancing, Photomasks, Monochromatic aberrations, Optical lithography, Optical calibration, Scanners, Lithography

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Proceedings Article | 24 March 2017 Paper

Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 10143, 101431V (2017) https://doi.org/10.1117/12.2258189

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Silicon carbide

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Proceedings Article | 4 October 2016 Paper

Mechanical stress induced by external forces in the extreme ultraviolet pellicle

Hyun-Ju Lee, Eun-Sang Park, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9985, 99851K (2016) https://doi.org/10.1117/12.2242174

KEYWORDS: Pellicles, Extreme ultraviolet, Finite element methods, Scanners, Silicon, Protactinium, Graphene, Zirconium, Silicon carbide, Molybdenum

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Proceedings Article | 26 September 2016 Paper

Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Min-Su Kim, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9985, 99850G (2016) https://doi.org/10.1117/12.2242999

KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

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SPIE Journal Paper | 1 August 2016

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Seong-Wook Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 03, 033504, (August 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033504

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics

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SPIE Journal Paper | 9 June 2016

Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle

Ki-Ho Ko, Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023506, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023506

KEYWORDS: Pellicles, Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Image transmission, Absorption, Nanoimprint lithography, Extreme ultraviolet lithography, Logic

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Proceedings Article | 10 May 2016 Paper

The impact of the residual stress on the EUV pellicle

Eun-Sang Park, Jae-Keun Choi, Min-Ha Kim, Sollee Hwang, Zahid Hussain Shamsi, Dai-Gyoung Kim, Hye-Keun Oh

Proceedings Volume 9984, 99840F (2016) https://doi.org/10.1117/12.2241276

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Manufacturing, Photomasks, Heat flux, Mirrors, Reflectivity, Thin films, Optical lithography

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SPIE Journal Paper | 9 May 2016

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023503, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023503

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Lithography, Optical lithography, Manufacturing, Oxides, 3D modeling

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Proceedings Article | 18 March 2016 Paper

Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Ki-Ho Ko, Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9776, 97760I (2016) https://doi.org/10.1117/12.2220155

KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Optical proximity correction, Optical lithography, Extreme ultraviolet lithography, Absorption, Image transmission, Critical dimension metrology, Nanoimprint lithography

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Proceedings Article | 18 March 2016 Paper

Stress-induced pellicle analysis for extreme-ultraviolet lithography

Eun-Sang Park, Min-Ha Kim, Sollee Hwang, Jung Hwan Kim, Hye-Keun Oh

Proceedings Volume 9776, 977626 (2016) https://doi.org/10.1117/12.2218219

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Lithography, Silicon, Finite element methods, Image quality, High volume manufacturing, Safety

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Proceedings Article | 18 March 2016 Paper

Feasibility of a new absorber material for high NA extreme ultraviolet lithography

Ki-Ho Ko, Hye-Keun Oh

Proceedings Volume 9776, 97762J (2016) https://doi.org/10.1117/12.2219576

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Photomasks, Lithography, Refractive index, Ruthenium, Phase velocity, Phase shifting, Nanoimprint lithography

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Proceedings Article | 18 March 2016 Paper

Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9776, 97762P (2016) https://doi.org/10.1117/12.2219874

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Lithographic illumination, Reflectivity, Critical dimension metrology, Lead

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SPIE Journal Paper | 29 January 2016

Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity

In-Seon Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 021003, (January 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021003

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Optical lithography, Absorption, Image transmission, Reflectivity

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Proceedings Article | 23 October 2015 Paper

Optical proximity correction for extreme ultra-violet mask with pellicle

Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

Proceedings Volume 9635, 96351F (2015) https://doi.org/10.1117/12.2196975

KEYWORDS: Pellicles, Optical proximity correction, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Logic, Semiconducting wafers, Ultraviolet radiation, High volume manufacturing, Optical lithography, Nanoimprint lithography, Image transmission

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SPIE Journal Paper | 7 October 2015

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-ho Ahn, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 14, Issue 04, 043501, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043501

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

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Proceedings Article | 9 July 2015 Paper

Patterning dependence on the mask defect for extreme ultraviolet lithography

Hye-Rim Ji, In-Seon Kim, Guk-Jin Kim, Jin-Goo Park, Min-Su Kim, Micheal Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 965813 (2015) https://doi.org/10.1117/12.2197751

KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

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Proceedings Article | 9 July 2015 Paper

Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity

In-Seon Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9658, 96580K (2015) https://doi.org/10.1117/12.2197752

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Absorption, Lead, Image transmission, Distortion

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Proceedings Article | 19 March 2015 Paper

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-Ho Ahn, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9422, 94221O (2015) https://doi.org/10.1117/12.2086052

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Semiconducting wafers, Radiation effects, Photomasks, Deep ultraviolet, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask is better than conventional absorber mask

Guk-Jin Kim, Hye-Keun Oh, In-Seon Kim, Michael Yeung, Eytan Barouch

Proceedings Volume 9256, 92560R (2014) https://doi.org/10.1117/12.2069885

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Semiconducting wafers, Image processing, Ultraviolet radiation, Lithography, Ruthenium, Ions, Oxidation

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Proceedings Article | 28 July 2014 Paper

Etched multilayer mask in EUV lithography for 16 nm node and below

Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9256, 92560Q (2014) https://doi.org/10.1117/12.2069404

KEYWORDS: Photomasks, Computer simulations, Extreme ultraviolet lithography, Diffraction, Lithographic illumination, Image enhancement, Etching, Binary data, Coherence (optics), Extreme ultraviolet

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Proceedings Article | 17 April 2014 Paper

193nm inspection of extreme ultraviolet mask absorber defect

Guk-Jin Kim, In-Seon Kim, Michael Yeung, Chang-Moon Lim, Hye-Keun Oh

Proceedings Volume 9048, 90482S (2014) https://doi.org/10.1117/12.2046587

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Extreme ultraviolet lithography, Reflectivity, Defect detection, Antireflective coatings, Multilayers, Oxidation

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Proceedings Article | 17 April 2014 Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

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Proceedings Article | 17 April 2014 Paper

A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation

Michael Yeung, Eytan Barouch, Hye-Keun Oh

Proceedings Volume 9048, 90481U (2014) https://doi.org/10.1117/12.2045618

KEYWORDS: Pellicles, Photomasks, Diffraction, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Transmittance, Electromagnetic simulation, Coherence (optics)

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Proceedings Article | 17 April 2014 Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

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Proceedings Article | 18 March 2014 Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171

KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

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Proceedings Article | 1 April 2013 Paper

Heat behavior of extreme-ultraviolet pellicle including mesh support

In-Seon Kim, Eun-Jin Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 8679, 86792X (2013) https://doi.org/10.1117/12.2012288

KEYWORDS: Pellicles, Silicon, Extreme ultraviolet, Nickel, Zirconium, Extreme ultraviolet lithography, Lithography, Temperature metrology, High volume manufacturing, Photomasks

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Proceedings Article | 23 March 2012 Paper

Is extreme ultraviolet pellicle possible? - in terms of heat absorption

In-Seon Kim, Hyung-Cheol Lee, Eun-Jin Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 8322, 83222X (2012) https://doi.org/10.1117/12.916377

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Absorption, Thermal modeling, Thin films, Photomasks, Lithography, Silicon, Contamination

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Proceedings Article | 23 March 2012 Paper

Effect of extreme-ultraviolet pellicle support to patterned mask

Ki-ho Ko, Eun-Jin Kim, Ji-Won Kim, Jun-Taek Park, Chang-Moon Lim, Hye-keun Oh

Proceedings Volume 8322, 832230 (2012) https://doi.org/10.1117/12.918019

KEYWORDS: Pellicles, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Thin films, Silicon, Computer simulations, Lithography, Distortion, Data modeling

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Proceedings Article | 5 April 2011 Paper

The effective etch process proximity correction methodology for improving on chip CD variation in 20 nm node DRAM gate

Jeong-Geun Park, Sang-wook Kim, Seong-Bo Shim, Sung-Soo Suh, Hye-Keun Oh

Proceedings Volume 7974, 79740Y (2011) https://doi.org/10.1117/12.881472

KEYWORDS: Etching, Photomasks, Critical dimension metrology, Personal protective equipment, Performance modeling, Transistors, Control systems, Instrument modeling, Scanning electron microscopy, Calibration

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Proceedings Article | 23 March 2010 Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seoung-Sue Kim, Han-Ku Cho, Jinho Ahn, Ilsin An, Hye-Keun Oh

Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895

KEYWORDS: Surface roughness, Extreme ultraviolet lithography, Reflectivity, Photomasks, Carbon, Extreme ultraviolet, Ruthenium, Image processing, Contamination, Optical lithography

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Proceedings Article | 4 March 2010 Paper

Pattern deformation caused by deformed pellicle with ArF exposure

Jee-Hye You, Ilsin An, Hye-Keun Oh

Proceedings Volume 7640, 76402E (2010) https://doi.org/10.1117/12.846483

KEYWORDS: Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Transmittance, Optical lithography, Laser energy, Prisms, Air contamination, Binary data

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Proceedings Article | 14 December 2009 Paper

Heat conduction from hot plate to photoresist on top of wafer including heat loss to the environment

Minhee Jung, Sarah Kim, Do Wan Kim, Hye-Keun Oh

Proceedings Volume 7520, 75202I (2009) https://doi.org/10.1117/12.837236

KEYWORDS: Semiconducting wafers, Silicon, Photoresist materials, Temperature metrology, Lithography, Diffusion, Dielectrics, Chemically amplified resists, Antireflective coatings, Nitrogen

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Proceedings Article | 14 December 2009 Paper

Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below

Jee-Hye You, Eun-Jin Kim, Hye-Keun Oh

Proceedings Volume 7520, 75202U (2009) https://doi.org/10.1117/12.837231

KEYWORDS: Lithography, Refractive index, Immersion lithography, Double patterning technology, Extreme ultraviolet lithography, Photomasks, Absorbance, Liquids, Lithographic illumination, Extreme ultraviolet

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Proceedings Article | 12 December 2009 Paper

Possible line edge roughness reduction by anisotropic molecular resist

Hyunsu Kim, In Wook Cho, Hakjin Jang, Mihwa Kang, Seong Wook Kim, Hye-Keun Oh

Proceedings Volume 7520, 75201L (2009) https://doi.org/10.1117/12.837234

KEYWORDS: Line edge roughness, Polymers, Monte Carlo methods, Diffusion, Line width roughness, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Edge roughness, Computer simulations

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