Dr. Kazumitsu Nakamura Profile

Dr. Kazumitsu Nakamura

Senior Researcher/Eng. at Hitachi High-Tech Taiwan Corp

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Author

Publications (8)

Proceedings Article | 28 August 2003 Paper

Arbitrary pattern fabrication with a LCD reticle-free exposure method

Tatsuo Morimoto, Kazumitsu Nakamura, Hiroshi Kubota, Akira Nakada, Takayuki Akamichi, Tsuneo Inokuchi, Kouji Kosaka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504264

KEYWORDS: LCDs, Reticles, Data conversion, Computer aided design, Manufacturing, Semiconducting wafers, Edge roughness, Control systems, Optics manufacturing, Computing systems

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Proceedings Article | 1 August 2002 Paper

Development of reticle-free exposure method with LCD projection image

Kazumitsu Nakamura, Hiroshi Kubota, Akira Nakada, Tsuneo Inokuchi, Kouji Kosaka

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476958

KEYWORDS: LCDs, Reticles, Transmittance, Opacity, LCD projection, Semiconducting wafers, Light sources, Projection systems, Lithography, Polarizers

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Proceedings Article | 27 December 1996 Paper

Application of direct-write electron-beam lithography for deep-submicron fabrication

Shyi-Long Shy, Jen Yew, Kazumitsu Nakamura, Chun-Yen Chang

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262816

KEYWORDS: Etching, Plasma, Electron beam lithography, Oxides, Semiconducting wafers, Plasma etching, Lithography, Silicon, Photomasks, Wafer-level optics

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Proceedings Article | 27 May 1996 Paper

Mix-and-match lithography processes for 0.1-um MOS transistor device fabrication

Jen Yew, Lih Chen, Kazumitsu Nakamura, Tien Chao, Horng-Chih Lin

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240468

KEYWORDS: Electron beam lithography, Etching, Silicon, Plasma, Photoresist processing, Optical alignment, Oxides, Lithography, Chemically amplified resists, Photomasks

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Proceedings Article | 8 December 1995 Paper

Powerful inspection and metrology tool for micro- and nanofabrication

Shyi-Long Shy, Tan Lei, Kazumitsu Nakamura, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228195

KEYWORDS: Inspection, Metrology, Quantum dots, Photomasks, Nanofabrication, Chromium, Atomic force microscopy, Electron beam lithography, Gallium arsenide, Scanning electron microscopy

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Proceedings Article | 8 December 1995 Paper

Mix-and-match lithography technology on 6-in. wafers for nanofabrication

Shyi-Long Shy, Tien Chao, C. Chu, Tan Lei, Kazumitsu Nakamura, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228194

KEYWORDS: Lithography, Semiconducting wafers, Electron beam lithography, Nanofabrication, Photoresist processing, Tantalum, Roads, Nanolithography, Chemically amplified resists, Control systems

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Proceedings Article | 9 July 1992 Paper

Electron-beam lithography system for high-precision reticle making

Takashi Matsuzaka, Hiroya Ohta, Norio Saitou, Katsuhiro Kawasaki, Kazumitsu Nakamura, Toshihiko Kohno, Morihisa Hoga

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136009

KEYWORDS: Reticles, Control systems, Monochromatic aberrations, Phase shifts, Electron beam lithography, Distortion, Control systems design, Photomasks, Lithography, Chromium

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Proceedings Article | 1 January 1992 Paper

Advanced e-beam lithography system in producing high-quality reticle for 64M-DRAM

Katsuhiro Kawasaki, Kazumitsu Nakamura, Takashi Matsuzaka, Hiroya Ohta, Norio Saitou, Toshihiko Kohno, Morihisa Hoga

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56937

KEYWORDS: Distortion, Reticles, Electron beam lithography, Photomasks, Lithography, Ions, Radon, Electron beams, Optical testing, Vibration simulation

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Showing 5 of 8 publications

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