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Kemal Dahha
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 27 April 2023 Presentation + Paper
Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements
Simon Mathijssen, Doogyu Lee, Jungmin Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Yao Gao, Han-Gyeol Park, Seung-Bin Yang, Mi-Yeon Baek, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren, Do-Haeng Lee
Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction
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