Kiichi Ishikawa
at Sony Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 11 May 2007 Paper
Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa
Proceedings Volume 6607, 66070C (2007) https://doi.org/10.1117/12.728925
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Printing, Etching, Binary data, Resolution enhancement technologies, Reflectivity, Scanning electron microscopy, Image enhancement

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920Y (2005) https://doi.org/10.1117/12.632021
KEYWORDS: Photomasks, Tolerancing, Immersion lithography, Error analysis, Lithography, Electroluminescence, Lithographic illumination, Critical dimension metrology, Scanners, Refractive index

Proceedings Article | 6 December 2004 Paper
Shinji Akima, Tooru Komizo, Saburo Kawakita, Yutaka Kodera, Tsuyoshi Narita, Kiichi Ishikawa
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.580003
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Defect detection, Visibility, Lithography, Scanning electron microscopy, Atomic force microscopy, Phase shift keying, Image enhancement

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504285
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Phase shifts, Printing, Lithography, 3D modeling, Optical lithography, Manufacturing, Data modeling

Proceedings Article | 30 December 1999 Paper
Ichiro Kagami, Kiichi Ishikawa, Daichi Kakuta, Hiroichi Kawahira
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373387
KEYWORDS: Carbon, Photomasks, Etching, Transmittance, Quartz, Phase shifts, Lithography, Opacity, Excimer lasers, Photoresist processing

Showing 5 of 8 publications
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