Koichi Sentoku
at Canon Inc
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 4 April 2011 Paper
Takahiro Miyakawa, Kazuhiro Sato, Koichi Sentoku, Hideki Ina
Proceedings Volume 7970, 79701N (2011) https://doi.org/10.1117/12.880910
KEYWORDS: Scatterometry, Nanoimprint lithography, Reflectivity, Photoresist processing, Polarization, Immersion lithography, Critical dimension metrology, Silicon, Remote sensing, Lithography

Proceedings Article | 3 April 2010 Paper
Takahiro Miyakawa, Koichi Sentoku, Kazuhiro Sato, Hideki Ina
Proceedings Volume 7637, 763721 (2010) https://doi.org/10.1117/12.855872
KEYWORDS: Scatterometry, Nanoimprint lithography, Polarization, Photoresist processing, Reflectivity, Remote sensing, Critical dimension metrology, Received signal strength, Cadmium, Lithography

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 727238 (2009) https://doi.org/10.1117/12.811776
KEYWORDS: Semiconducting wafers, Finite element methods, Semiconductors, Data modeling, Control systems, Critical dimension metrology, Semiconductor manufacturing, High volume manufacturing, Wafer testing, Inspection

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71400Q (2008) https://doi.org/10.1117/12.805314
KEYWORDS: Semiconducting wafers, Manufacturing, Finite element methods, Data modeling, Semiconductors, Control systems, Semiconductor manufacturing, Critical dimension metrology, Optics manufacturing, Optical testing

Proceedings Article | 25 March 2008 Paper
Proceedings Volume 6922, 69223L (2008) https://doi.org/10.1117/12.768906
KEYWORDS: Overlay metrology, Scatterometry, Optical alignment, Lithography, Inspection, Semiconductors, Silicon, Semiconducting wafers, Distortion, Metrology

Showing 5 of 12 publications
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