Dr. Li-Wen Chang Profile

Dr. Li-Wen Chang

PostDoc at Stanford Univ

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Publications (7)

Proceedings Article | 21 March 2012 Paper

Contact-hole patterning for random logic circuits using block copolymer directed self-assembly

He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, H.-S. Philip Wong

Proceedings Volume 8323, 83230W (2012) https://doi.org/10.1117/12.912804

KEYWORDS: Optical lithography, Logic, Electron beam lithography, Transistors, Scanning electron microscopy, Binary data, Lithography, Very large scale integration, Silicon, Directed self assembly

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Proceedings Article | 6 March 2012 Open Access

Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

H.-S. Philip Wong, Chris Bencher, He Yi, Xin-Yu Bao, Li-Wen Chang

Proceedings Volume 8323, 832303 (2012) https://doi.org/10.1117/12.918312

KEYWORDS: Optical lithography, Lithography, Semiconductors, Scanning electron microscopy, Baryon acoustic oscillations, Semiconductor manufacturing, Logic, Double patterning technology, Photomasks, Directed self assembly

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Proceedings Article | 23 March 2011 Paper

Mandrel-based patterning: density multiplication techniques for 15nm nodes

Chris Bencher, Huixiong Dai, Liyan Miao, Yongmei Chen, Ping Xu, Yijian Chen, Shiany Oemardani, Jason Sweis, Vincent Wiaux, Jan Hermans, Li-Wen Chang, Xinyu Bao, He Yi, H.-S. Philip Wong

Proceedings Volume 7973, 79730K (2011) https://doi.org/10.1117/12.881679

KEYWORDS: Optical lithography, Photomasks, Line width roughness, Lithography, Semiconducting wafers, Back end of line, Double patterning technology, Logic, Extreme ultraviolet, Directed self assembly

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Proceedings Article | 3 April 2010 Paper

SLICE image analysis for diblock copolymer characterization and process optimization

Yang Hong, Li-Wen Chang, Albert Lin, H.-S. Philip Wong

Proceedings Volume 7637, 76371J (2010) https://doi.org/10.1117/12.848378

KEYWORDS: Image processing, Scanning electron microscopy, Image analysis, Binary data, Image quality, Metrology, Data analysis, Statistical analysis, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 2 April 2010 Paper

CMOS process compatible directed block copolymer self-assembly for 20nm contact holes and beyond

Li-Wen Chang, Xin-Yu Bao, H.-S. Philip Wong

Proceedings Volume 7637, 76370I (2010) https://doi.org/10.1117/12.848430

KEYWORDS: Lithography, Field effect transistors, Semiconducting wafers, Optical lithography, Platinum, Chromium, Atomic layer deposition, Silicon, Annealing, Etching

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Proceedings Article | 20 March 2008 Paper

Diblock copolymer directed self-assembly for CMOS device fabrication

Li-Wen Chang, Marissa Caldwell, H.-S. Philip Wong

Proceedings Volume 6921, 69212M (2008) https://doi.org/10.1117/12.772000

KEYWORDS: Silica, Silicon, Lithography, Photomasks, Polymers, Platinum, Field effect transistors, Photoresist materials, Etching, Plasma etching

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Proceedings Article | 14 March 2006 Paper

Diblock copolymer directed self-assembly for CMOS device fabrication

Li-Wen Chang, H.-S. Philip Wong

Proceedings Volume 6156, 615611 (2006) https://doi.org/10.1117/12.661028

KEYWORDS: Annealing, Field effect transistors, Optical lithography, Photoresist materials, Metals, Polymethylmethacrylate, Lithography, Binary data, Semiconducting wafers, Directed self assembly

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Showing 5 of 7 publications

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