Dr. Xin-Yu Bao
Senior Process Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2013 Paper
He Yi, Xin-Yu Bao, Richard Tiberio, H.-S. Philip Wong
Proceedings Volume 8680, 868010 (2013) https://doi.org/10.1117/12.2011263
KEYWORDS: Optical lithography, Integrated circuits, Electron beam lithography, Integrated circuit design, Lithography, Transmission electron microscopy, Directed self assembly, Logic, Error analysis, Neodymium

Proceedings Article | 21 March 2012 Paper
He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, H.-S. Philip Wong
Proceedings Volume 8323, 83230W (2012) https://doi.org/10.1117/12.912804
KEYWORDS: Optical lithography, Logic, Electron beam lithography, Transistors, Scanning electron microscopy, Binary data, Lithography, Very large scale integration, Silicon, Directed self assembly

Proceedings Article | 6 March 2012 Open Access Paper
H.-S. Philip Wong, Chris Bencher, He Yi, Xin-Yu Bao, Li-Wen Chang
Proceedings Volume 8323, 832303 (2012) https://doi.org/10.1117/12.918312
KEYWORDS: Optical lithography, Lithography, Semiconductors, Scanning electron microscopy, Baryon acoustic oscillations, Semiconductor manufacturing, Logic, Double patterning technology, Photomasks, Directed self assembly

Proceedings Article | 23 February 2012 Paper
Dong Liang, Yangsen Kang, Yijie Huo, Ken Xinze Wang, Anjia Gu, Meiyueh Tan, Zongfu Yu, Shuang Li, Jieyang Jia, Xinyu Bao, Shuang Wang, Yan Yao, Shanhui Fan, Yi Cui, James Harris
Proceedings Volume 8269, 82692M (2012) https://doi.org/10.1117/12.909743
KEYWORDS: Nanostructures, Absorption, Thin films, Gallium arsenide, Solar cells, Nanostructured thin films, Thin film solar cells, Nanostructuring, Optical spheres, Light wave propagation

Proceedings Article | 23 March 2011 Paper
Chris Bencher, Huixiong Dai, Liyan Miao, Yongmei Chen, Ping Xu, Yijian Chen, Shiany Oemardani, Jason Sweis, Vincent Wiaux, Jan Hermans, Li-Wen Chang, Xinyu Bao, He Yi, H.-S. Philip Wong
Proceedings Volume 7973, 79730K (2011) https://doi.org/10.1117/12.881679
KEYWORDS: Optical lithography, Photomasks, Line width roughness, Lithography, Semiconducting wafers, Back end of line, Double patterning technology, Logic, Extreme ultraviolet, Directed self assembly

Showing 5 of 6 publications
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